Issued Patents All Time
Showing 26–50 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE43508 | Plasma confinement by use of preferred RF return path | — | 2012-07-17 |
| 8105441 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus | Robert O'Donnell, Mark Wilcoxson, Mike Ravkin, Alexander A. Yatskar | 2012-01-31 |
| 8080760 | Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor | Rajinder Dhindsa, Andy W. DeSepte, Lumin Li | 2011-12-20 |
| 8000082 | Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same | Rajinder Dhindsa, Lumin Li, Felix Kozakevich | 2011-08-16 |
| 7946303 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus | Robert O'Donnell, Mark Wilcoxson, Mike Ravkin, Alexander A. Yatskar | 2011-05-24 |
| 7867356 | Apparatus for reducing polymer deposition on a substrate and substrate support | Jose Tong | 2011-01-11 |
| 7838086 | Magnetic enhancement for mechanical confinement of plasma | Douglas Keil, Lumin Li, Eric A. Hudson, Reza Sadjadi, Rajinder Dhindsa +1 more | 2010-11-23 |
| 7732728 | Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor | Rajinder Dhindsa, Andy W. DeSepte, Lumin Li | 2010-06-08 |
| 7712434 | Apparatus including showerhead electrode and heater for plasma processing | Rajinder Dhindsa | 2010-05-11 |
| 7708859 | Gas distribution system having fast gas switching capabilities | Zhisong Huang, Jose Tong Sam, Rajinder Dhindsa, Reza Sadjadi | 2010-05-04 |
| RE41266 | Composite electrode for plasma processes | Raymond L. Degner | 2010-04-27 |
| 7632375 | Electrically enhancing the confinement of plasma | Andras Kuthi, Jisoo Kim, Rajindar Dhindsa, Lumin Li, Reza Sadjadi | 2009-12-15 |
| 7525787 | Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same | Rajinder Dhindsa, Lumin Li, Felix Kozakevich | 2009-04-28 |
| 7524397 | Lower electrode design for higher uniformity | Fangli Hao, Albert R. Ellingboe | 2009-04-28 |
| 7455748 | Magnetic enhancement for mechanical confinement of plasma | Douglas Keil, Lumin Li, Eric A. Hudson, Reza Sadjadi, Rajinder Dhindsa +1 more | 2008-11-25 |
| 7405521 | Multiple frequency plasma processor method and apparatus | Raj Dhindsa, S. M. Reza Sadjadi, Felix Kozakevich, Dave Trussell, Lumin Li +5 more | 2008-07-29 |
| 7393432 | RF ground switch for plasma processing system | Rajinder Dhindsa, Felix Kozakevich, Russell Martin | 2008-07-01 |
| 7252738 | Apparatus for reducing polymer deposition on a substrate and substrate support | Jose Tong | 2007-08-07 |
| 7093560 | Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system | Jose Tong | 2006-08-22 |
| 7094315 | Chamber configuration for confining a plasma | Jian J. Chen, Mukund Srinivasan | 2006-08-22 |
| 6984288 | Plasma processor in plasma confinement region within a vacuum chamber | Rajinder Dhindsa, Mukund Srinivasan, Lumin Li | 2006-01-10 |
| 6949204 | Deformation reduction at the main chamber | Albert R. Ellingboe, Fangli Hao | 2005-09-27 |
| 6872281 | Chamber configuration for confining a plasma | Jian J. Chen, Mukund Srinivasan | 2005-03-29 |
| 6863784 | Linear drive system for use in a plasma processing system | Fangli Hao, Keith Dawson | 2005-03-08 |
| 6838012 | Methods for etching dielectric materials | — | 2005-01-04 |