| 8890412 |
Plasma source electrode |
David O'Farrell, Tomasz Michna |
2014-11-18 |
| 8845855 |
Electrode for plasma processes and method for manufacture and use thereof |
Jerome S. Hubacek, David W. Benzing |
2014-09-30 |
| 8680770 |
Power splitter |
Tomasz Michna |
2014-03-25 |
| 7886690 |
Plasma source |
— |
2011-02-15 |
| 7589470 |
Method and apparatus for producing plasma |
Lutfi Oksuz |
2009-09-15 |
| 7524397 |
Lower electrode design for higher uniformity |
Fangli Hao, Eric H. Lenz |
2009-04-28 |
| 7470627 |
Wafer area pressure control for plasma confinement |
Taejoon Han, David W. Benzing |
2008-12-30 |
| 7342361 |
Plasma source |
— |
2008-03-11 |
| RE39988 |
Deposition of dopant impurities and pulsed energy drive-in |
Paul Wickboldt, Paul G. Carey, Patrick Smith |
2008-01-01 |
| 6949204 |
Deformation reduction at the main chamber |
Eric H. Lenz, Fangli Hao |
2005-09-27 |
| 6841943 |
Plasma processor with electrode simultaneously responsive to plural frequencies |
Vahid Vahedi, Peter Loewenhardt, Andras Kuthi, Andreas Fischer |
2005-01-11 |
| 6823815 |
Wafer area pressure control for plasma confinement |
Taejoon Han, David W. Benzing |
2004-11-30 |
| 6712929 |
Deformation reduction at the main chamber |
Eric H. Lenz, Fangli Hao |
2004-03-30 |
| 6492774 |
Wafer area pressure control for plasma confinement |
Taejoon Han, David W. Benzing |
2002-12-10 |
| 6490536 |
Integrated load simulator |
Bruno Morel |
2002-12-03 |
| 6436739 |
Thick adherent dielectric films on plastic substrates and method for depositing same |
Paul Wickboldt, Steven D. Theiss, Patrick Smith |
2002-08-20 |
| 6363882 |
Lower electrode design for higher uniformity |
Fangli Hao, Eric H. Lenz |
2002-04-02 |
| 6204607 |
Plasma source with multiple magnetic flux sources each having a ferromagnetic core |
— |
2001-03-20 |
| 5918140 |
Deposition of dopant impurities and pulsed energy drive-in |
Paul Wickboldt, Paul G. Carey, Patrick Smith |
1999-06-29 |
| 5824602 |
Helicon wave excitation to produce energetic electrons for manufacturing semiconductors |
Arthur W. Molvik |
1998-10-20 |
| 5686796 |
Ion implantation helicon plasma source with magnetic dipoles |
Roderick Boswell, John H. Keller |
1997-11-11 |
| 5387777 |
Methods and apparatus for contamination control in plasma processing |
Reid S. Bennett, George G. Gifford, Kurt L. Haller, John S. McKillop, Gary S. Selwyn +1 more |
1995-02-07 |
| 5367139 |
Methods and apparatus for contamination control in plasma processing |
Reid S. Bennett, George G. Gifford, Kurt L. Haller, John S. McKillop, Gary S. Selwyn +1 more |
1994-11-22 |
