Issued Patents All Time
Showing 26–50 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7682516 | Vertical profile fixing | Peter Cirigliano, Jisoo Kim, Zhisong Huang, Eric A. Hudson | 2010-03-23 |
| 7682479 | Fin structure formation | Zhi-Song Huang | 2010-03-23 |
| 7629259 | Method of aligning a reticle for formation of semiconductor devices | — | 2009-12-08 |
| 7560388 | Self-aligned pitch reduction | Jisoo Kim, Sangheon Lee, Daehan Choi | 2009-07-14 |
| 7541291 | Reduction of feature critical dimensions | Sean S. Kang, Sangheon Lee, Wan-Lin Chen, Eric A. Hudson, Gan Ming Zhao | 2009-06-02 |
| 7539969 | Computer readable mask shrink control processor | Nicolas Bright | 2009-05-26 |
| 7491647 | Etch with striation control | Peter Cirigliano, Ji Soo Kim, Zhisong Huang, Eric A. Hudson | 2009-02-17 |
| 7485581 | Device with gaps for capacitance reduction | Zhi-Song Huang | 2009-02-03 |
| 7476610 | Removable spacer | Ji Soo Kim, Conan Chiang, Daehan Choi, Michael Goss | 2009-01-13 |
| 7465525 | Reticle alignment and overlay for multiple reticle process | Nicolas Bright | 2008-12-16 |
| 7429533 | Pitch reduction | Zhisong Huang, Jeffrey Marks | 2008-09-30 |
| 7405521 | Multiple frequency plasma processor method and apparatus | Raj Dhindsa, Felix Kozakevich, Dave Trussell, Lumin Li, Eric H. Lenz +5 more | 2008-07-29 |
| 7390749 | Self-aligned pitch reduction | Ji Soo Kim, Sangheon Lee, Daehan Choi | 2008-06-24 |
| 7347915 | Plasma in-situ treatment of chemically amplified resist | Douglas Keil, Wan-Lin Chen, Eric A. Hudson, Mark Wilcoxson, Andrew D. Bailey, III | 2008-03-25 |
| 7311852 | Method of plasma etching low-k dielectric materials | Si Yi Li, Helen Zhu, James V. Tietz, Bryan A. Helmer | 2007-12-25 |
| 7309646 | De-fluoridation process | Dongho Heo, Jisoo Kim | 2007-12-18 |
| 7273815 | Etch features with reduced line edge roughness | Eric A. Hudson | 2007-09-25 |
| 7271108 | Multiple mask process with etch mask stack | — | 2007-09-18 |
| 7271107 | Reduction of feature critical dimensions using multiple masks | Jeffrey Marks | 2007-09-18 |
| 7264743 | Fin structure formation | Zhi-Song Huang | 2007-09-04 |
| 7250371 | Reduction of feature critical dimensions | Sean S. Kang, Sangheon Lee, Wan-Lin Chen, Eric A. Hudson, Gan Ming Zhao | 2007-07-31 |
| 7241683 | Stabilized photoresist structure for etching process | Eric A. Hudson | 2007-07-10 |
| 7166535 | Plasma etching of silicon carbide | Si Yi Li, James V. Tietz | 2007-01-23 |
| 7098130 | Method of forming dual damascene structure | Ji Soo Kim, Sangheon Lee | 2006-08-29 |
| 7049052 | Method providing an improved bi-layer photoresist pattern | Hanzhong Xiao, Helen Zhu, Kuo-Lung Tang | 2006-05-23 |