Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11685265 | Vehicle trailer with parasitic charging | Larry Deaton | 2023-06-27 |
| 9829805 | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor | Timothy Michaelson, Timothy Weidman, Barry Chin, Majeed A. Foad | 2017-11-28 |
| 9632411 | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor | Timothy Michaelson, Timothy Weidman, Barry Chin, Majeed A. Foad | 2017-04-25 |
| 9236467 | Atomic layer deposition of hafnium or zirconium alloy films | Timothy Weidman, Timothy Michaelson, Paul F. Ma | 2016-01-12 |
| 8536068 | Atomic layer deposition of photoresist materials and hard mask precursors | Timothy Weidman, Timothy Michaelson | 2013-09-17 |
| 8465903 | Radiation patternable CVD film | Timothy Weidman, Timothy Michaelson, Nitin K. Ingle, Abhijit Basu Mallick, Amit Chatterjee | 2013-06-18 |
| 7794544 | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system | Son T. Nguyen, Kedarnath Sangam, Miriam Schwartz, Kenric Choi, Sanjay Bhat +4 more | 2010-09-14 |
| 7775508 | Ampoule for liquid draw and vapor draw with a continuous level sensor | Kenric Choi, Pravin K. Narwankar, Shreyas Kher, Son T. Nguyen, Khai Ngo +3 more | 2010-08-17 |
| 6133152 | Co-rotating edge ring extension for use in a semiconductor processing chamber | Benjamin Bierman, Meredith J. Williams, David S. Ballance, Brian Haas, James V. Tietz | 2000-10-17 |
| 6123766 | Method and apparatus for achieving temperature uniformity of a substrate | Meredith J. Williams, David S. Ballance, Benjamin Bierman, Brian Haas, Nobuyuki Takahashi +1 more | 2000-09-26 |
| 6048403 | Multi-ledge substrate support for a thermal processing chamber | Meredith J. Williams | 2000-04-11 |
| 6035100 | Reflector cover for a semiconductor processing chamber | Benjamin Bierman, David S. Ballance, James V. Tietz, Brian Haas, Meredith J. Williams | 2000-03-07 |
| 5960555 | Method and apparatus for purging the back side of a substrate during chemical vapor processing | Benjamin Bierman, Meredith J. Williams, Brian Haas, David S. Ballance, James V. Tietz | 1999-10-05 |
| 5322567 | Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus | Norma Riley, James V. Rinnovatore | 1994-06-21 |
| 5178681 | Suspension system for semiconductor reactors | Joseph C. Moore | 1993-01-12 |