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Vehicle trailer with parasitic charging |
Larry Deaton |
2023-06-27 |
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Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
Timothy Michaelson, Timothy Weidman, Barry Chin, Majeed A. Foad |
2017-11-28 |
| 9632411 |
Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
Timothy Michaelson, Timothy Weidman, Barry Chin, Majeed A. Foad |
2017-04-25 |
| 9236467 |
Atomic layer deposition of hafnium or zirconium alloy films |
Timothy Weidman, Timothy Michaelson, Paul F. Ma |
2016-01-12 |
| 8536068 |
Atomic layer deposition of photoresist materials and hard mask precursors |
Timothy Weidman, Timothy Michaelson |
2013-09-17 |
| 8465903 |
Radiation patternable CVD film |
Timothy Weidman, Timothy Michaelson, Nitin K. Ingle, Abhijit Basu Mallick, Amit Chatterjee |
2013-06-18 |
| 7794544 |
Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
Son T. Nguyen, Kedarnath Sangam, Miriam Schwartz, Kenric Choi, Sanjay Bhat +4 more |
2010-09-14 |
| 7775508 |
Ampoule for liquid draw and vapor draw with a continuous level sensor |
Kenric Choi, Pravin K. Narwankar, Shreyas Kher, Son T. Nguyen, Khai Ngo +3 more |
2010-08-17 |
| 6133152 |
Co-rotating edge ring extension for use in a semiconductor processing chamber |
Benjamin Bierman, Meredith J. Williams, David S. Ballance, Brian Haas, James V. Tietz |
2000-10-17 |
| 6123766 |
Method and apparatus for achieving temperature uniformity of a substrate |
Meredith J. Williams, David S. Ballance, Benjamin Bierman, Brian Haas, Nobuyuki Takahashi +1 more |
2000-09-26 |
| 6048403 |
Multi-ledge substrate support for a thermal processing chamber |
Meredith J. Williams |
2000-04-11 |
| 6035100 |
Reflector cover for a semiconductor processing chamber |
Benjamin Bierman, David S. Ballance, James V. Tietz, Brian Haas, Meredith J. Williams |
2000-03-07 |
| 5960555 |
Method and apparatus for purging the back side of a substrate during chemical vapor processing |
Benjamin Bierman, Meredith J. Williams, Brian Haas, David S. Ballance, James V. Tietz |
1999-10-05 |
| 5322567 |
Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus |
Norma Riley, James V. Rinnovatore |
1994-06-21 |
| 5178681 |
Suspension system for semiconductor reactors |
Joseph C. Moore |
1993-01-12 |
