Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Co-rotating edge ring extension for use in a semiconductor processing chamber

Co-rotating edge ring extension for use in a semiconductor processing chamber

US Patent 6133152 · Granted Oct 17, 2000

Estimated economic value: $75,805,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vehicle trailer with parasitic charging2023
Vapor deposition deposited photoresist, and manufacturing and lithography system2017
Vapor deposition deposited photoresist, and manufacturing and lithography system2017
Methods for verifying gas flow rates from a gas supply system into a plasma proc2016
Atomic layer deposition of hafnium or zirconium alloy films2016
Method and system for non-destructive distribution profiling of an element in a 2015
Method and system for non-destructive distribution profiling of an element in a 2014
Method and system for non-destructive distribution profiling of an element in a 2013
Atomic layer deposition of photoresist materials and hard mask precursors2013
Apparatus for delivering a process gas2013
Radiation patternable CVD film2013
Method and system for non-destructive distribution profiling of an element in a 2012