Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Brian Haas — 12 Patents

Applied Materials: 10 patents #1,301 of 7,310Top 20%
Kla-Tencor: 2 patents #853 of 2,049Top 45%
San Jose, CA: #5,425 of 32,062 inventorsTop 20%
California: #51,404 of 386,348 inventorsTop 15%
Overall (All Time): #396,045 of 4,157,543Top 10%
12 Patents All Time
Brian Haas has been granted 12 US patents while listed as an inventor at Applied Materials. The first was granted in 1999 and the most recent in November 2011. Brian Haas ranks #396,045 of 4,157,543 US inventors in our database (top 9.5%). Patent records list Brian Haas in San Jose, CA, US.

Patents per Year

Patents granted per year, 1999 to 2011Bar chart with a peak of 3 patents in 2000.peak 31999: 2 patents19992000: 3 patents20002001: 2 patents20012004: 1 patents20042006: 2 patents20062008: 1 patents20082011: 1 patents2011

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8068234 Method and apparatus for measuring shape or thickness information of a substrate Shouhong Tang, George Kren, Dieter Mueller, Daniel Kavaldjiev 2011-11-29 $45,856,000
7436505 Computer-implemented methods and systems for determining a configuration for a light scattering inspection system Alexander Belyaev, Daniel Kavaldjiev, Amith Murali, Aleksey Petrenko, Mike Kirk +2 more 2008-10-14 $5,848,000
7127367 Tailored temperature uniformity Balasubramanian Ramachandran, Joseph M. Ranish, Ravi Jallepally, Sundar Ramamurthy, Raman Achutharaman +1 more 2006-10-24 $28,103,000
7041931 Stepped reflector plate Dean Jennings, Joseph M. Ranish, Ajit Balakrishna, Sundar Ramamurthy, Aaron Muir Hunter +1 more 2006-05-09 $14,267,000
6803546 Thermally processing a substrate Ryan Boas, Ajit Balakrishna, Benjamin Bierman, Dean Jennings, Wolfgang Aderhold +2 more 2004-10-12 $28,243,000
6280790 Reducing the deposition rate of volatile contaminants onto an optical component of a substrate processing system Anthony F. White, Satheesh Kuppurao 2001-08-28 $57,393,000
6215106 Thermally processing a substrate Ryan Boas, Ajit Balakrishna, Benjamin Bierman, Dean Jennings, Wolfgang Aderhold 2001-04-10 $95,964,000
6133152 Co-rotating edge ring extension for use in a semiconductor processing chamber Benjamin Bierman, Meredith J. Williams, David S. Ballance, Paul Deaton, James V. Tietz 2000-10-17 $75,805,000
6123766 Method and apparatus for achieving temperature uniformity of a substrate Meredith J. Williams, David S. Ballance, Benjamin Bierman, Paul Deaton, Nobuyuki Takahashi +1 more 2000-09-26 $91,857,000
6035100 Reflector cover for a semiconductor processing chamber Benjamin Bierman, David S. Ballance, James V. Tietz, Meredith J. Williams, Paul Deaton 2000-03-07 $83,205,000
5960555 Method and apparatus for purging the back side of a substrate during chemical vapor processing Paul Deaton, Benjamin Bierman, Meredith J. Williams, David S. Ballance, James V. Tietz 1999-10-05 $73,011,000
5920797 Method for gaseous substrate support David S. Ballance, Benjamin Bierman, James V. Tietz 1999-07-06 $75,710,000