Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8229587 | Semiconductor fabrication facility visualization system with performance optimization | Karl Shieh, Michael A. Cookson, Donald R. Wright, Joseph J. Fatula, Jr. | 2012-07-24 |
| 7515049 | Extended read range RFID system | Arun Sharma, Daniel Fritschen, Daniel Liu | 2009-04-07 |
| 7290813 | Active edge grip rest pad | Anthony C. Bonora, Roger G. Hine, D. Wayne Nobles, Jr. | 2007-11-06 |
| 6833322 | Apparatuses and methods for depositing an oxide film | Roger N. Anderson, Paul B. Comita, Ann Waldhauer | 2004-12-21 |
| 6685779 | Method and a system for sealing an epitaxial silicon layer on a substrate | David K. Carlson, Paul B. Comita, Dale R. Du Bois | 2004-02-03 |
| 6562720 | Apparatus and method for surface finishing a silicon film | Anna Lena Thilderkvist, Paul B. Comita, Lance A. Scudder | 2003-05-13 |
| 6500734 | Gas inlets for wafer processing chamber | Roger N. Anderson, Peter Hey, David K. Carlson, Mahalingam Venkatesan | 2002-12-31 |
| 6489241 | Apparatus and method for surface finishing a silicon film | Anna Lena Thilderkvist, Paul B. Comita, Lance A. Scudder | 2002-12-03 |
| 6399510 | Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates | Roger N. Anderson, Grant D. Imper, Paul B. Comita | 2002-06-04 |
| 6376387 | Method of sealing an epitaxial silicon layer on a substrate | David K. Carlson, Paul B. Comita, Dale R. Du Bois | 2002-04-23 |
| 6366861 | Method of determining a wafer characteristic using a film thickness monitor | Ann Waldhauer, Paul B. Comita | 2002-04-02 |
| 6254686 | Vented lower liner for heating exhaust gas from a single substrate reactor | Paul B. Comita, David K. Carlson, Doria W. Fan, Rekha Ranganathan | 2001-07-03 |
| 6171966 | Delineation pattern for epitaxial depositions | Thomas E. Deacon | 2001-01-09 |
| 6153260 | Method for heating exhaust gas in a substrate reactor | Paul B. Comita, David K. Carlson, Doria W. Fan, Rekha Ranganathan | 2000-11-28 |
| 6083323 | Method for controlling the temperature of the walls of a reaction chamber during processing | David K. Carlson, Roger N. Anderson | 2000-07-04 |
| 5916369 | Gas inlets for wafer processing chamber | Roger N. Anderson, Peter Hey, David K. Carlson, Mahalingam Venkatesan | 1999-06-29 |
| 5855677 | Method and apparatus for controlling the temperature of reaction chamber walls | David K. Carlson, Roger N. Anderson | 1999-01-05 |
| 5411593 | Apparatus for servicing vacuum chamber using non-reactive gas filled maintenance enclosure | David K. Carlson | 1995-05-02 |
| 5322567 | Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus | Paul Deaton, James V. Rinnovatore | 1994-06-21 |
| 5316794 | Method for servicing vacuum chamber using non-reactive gas-filled maintenance enclosure | David K. Carlson | 1994-05-31 |
| 5298107 | Processing method for growing thick films | Lance A. Scudder, Jon M. Schalla | 1994-03-29 |
| 5198071 | Process for inhibiting slip and microcracking while forming epitaxial layer on semiconductor wafer | Lance A. Scudder | 1993-03-30 |