Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system

Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system

US Patent 7794544 · Granted Sep 14, 2010

Estimated economic value: $9,681,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Low temperature silicon oxide coating for pharmaceutical applications2025
Rotary reactor for uniform particle coating with thin films2025
Methods and apparatus for processing a substrate2025
Capacitive sensor for monitoring gas concentration2025
Eco-efficiency monitoring and exploration platform for semiconductor manufacturi2025
Coated drug compositions and methods of preparing the same2024
Particle coating methods and apparatus2024
Reactor for coating particles in stationary chamber with rotating paddles2024
Control of liquid delivery in auto-refill systems2024
Reactor for coating particles in stationary chamber with rotating paddles and ga2024
Temperature offset and zone control tuning2024
Low temperature process for preparing silicon oxide coated pharmaceuticals2024