Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11469079 | Ultrahigh selective nitride etch to form FinFET devices | Kwame Eason, Dengliang Yang, Pilyeon Park, Joon Hong Park, Mark Kawaguchi +3 more | 2022-10-11 |
| 10679868 | Isotropic atomic layer etch for silicon oxides using no activation | Ivan L. Berry, III, Pilyeon Park | 2020-06-09 |
| 10283615 | Ultrahigh selective polysilicon etch with high throughput | Dengliang Yang, Kwame Eason, Joon Hong Park | 2019-05-07 |
| 10192751 | Systems and methods for ultrahigh selective nitride etch | Dengliang Yang, Pilyeon Park, Helen Zhu, Joon Hong Park | 2019-01-29 |
| 9911620 | Method for achieving ultra-high selectivity while etching silicon nitride | Helen Zhu, Linda Marquez, Pilyeon Park, Ivan L. Berry, III, Ivelin Angelov +1 more | 2018-03-06 |
| 9425041 | Isotropic atomic layer etch for silicon oxides using no activation | Ivan L. Berry, III, Pilyeon Park | 2016-08-23 |