| 11469079 |
Ultrahigh selective nitride etch to form FinFET devices |
Dengliang Yang, Pilyeon Park, Faisal Yaqoob, Joon Hong Park, Mark Kawaguchi +3 more |
2022-10-11 |
| 11011388 |
Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching |
Pilyeon Park, Mark Kawaguchi, Seung Ho Park, Hsiao-Wei Chang |
2021-05-18 |
| 10283615 |
Ultrahigh selective polysilicon etch with high throughput |
Dengliang Yang, Faisal Yaqoob, Joon Hong Park |
2019-05-07 |
| 10276398 |
High aspect ratio selective lateral etch using cyclic passivation and etching |
Pilyeon Park, Mark Kawaguchi, Seung Ho Park, Hsiao-Wei Chang |
2019-04-30 |
| 10147588 |
System and method for increasing electron density levels in a plasma of a substrate processing system |
James Eugene Caron, Ivelin Angelov, Joon Hong Park, Dengliang Yang |
2018-12-04 |
