Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11469079 | Ultrahigh selective nitride etch to form FinFET devices | Kwame Eason, Dengliang Yang, Faisal Yaqoob, Joon Hong Park, Mark Kawaguchi +3 more | 2022-10-11 |
| 11011388 | Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching | Kwame Eason, Mark Kawaguchi, Seung Ho Park, Hsiao-Wei Chang | 2021-05-18 |
| 10679868 | Isotropic atomic layer etch for silicon oxides using no activation | Ivan L. Berry, III, Faisal Yaqoob | 2020-06-09 |
| 10276398 | High aspect ratio selective lateral etch using cyclic passivation and etching | Kwame Eason, Mark Kawaguchi, Seung Ho Park, Hsiao-Wei Chang | 2019-04-30 |
| 10192751 | Systems and methods for ultrahigh selective nitride etch | Dengliang Yang, Faisal Yaqoob, Helen Zhu, Joon Hong Park | 2019-01-29 |
| 9911620 | Method for achieving ultra-high selectivity while etching silicon nitride | Helen Zhu, Linda Marquez, Faisal Yaqoob, Ivan L. Berry, III, Ivelin Angelov +1 more | 2018-03-06 |
| 9870932 | Pressure purge etch method for etching complex 3-D structures | Joydeep Guha | 2018-01-16 |
| 9425041 | Isotropic atomic layer etch for silicon oxides using no activation | Ivan L. Berry, III, Faisal Yaqoob | 2016-08-23 |