Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347650 | Substrate processing system including dual ion filter for downstream plasma | Andrew Stratton Bravo, Chih-Hsun Hsu, Serge Kosche, Stephen Whitten, Shih-Chung Kon +3 more | 2025-07-01 |
| 12080592 | Film stack simplification for high aspect ratio patterning and vertical scaling | Hui-Jung Wu, Bart J. van Schravendijk, Gereng Gunawan, Jay E. Uglow, Nagraj Shankar +11 more | 2024-09-03 |
| 12040193 | Efficient cleaning and etching of high aspect ratio structures | Ji Zhu, Nathan Musselwhite | 2024-07-16 |
| 11967486 | Substrate processing system including dual ion filter for downstream plasma | Andrew Stratton Bravo, Chih-Hsun Hsu, Serge Kosche, Stephen Whitten, Shih-Chung Kon +3 more | 2024-04-23 |
| 11488831 | Efficient cleaning and etching of high aspect ratio structures | Ji Zhu, Nathan Musselwhite | 2022-11-01 |
| 11469079 | Ultrahigh selective nitride etch to form FinFET devices | Kwame Eason, Dengliang Yang, Pilyeon Park, Faisal Yaqoob, Joon Hong Park +3 more | 2022-10-11 |
| 11065654 | In situ vapor deposition polymerization to form polymers as precursors to viscoelastic fluids for particle removal from substrates | Gregory Blachut | 2021-07-20 |
| 11062897 | Metal doped carbon based hard mask removal in semiconductor fabrication | Yongsik Yu, David Cheung, Kirk Ostrowski, Nikkon Ghosh, Karthik S. Colinjivadi +2 more | 2021-07-13 |
| 11011388 | Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching | Kwame Eason, Pilyeon Park, Seung Ho Park, Hsiao-Wei Chang | 2021-05-18 |
| 10276398 | High aspect ratio selective lateral etch using cyclic passivation and etching | Kwame Eason, Pilyeon Park, Seung Ho Park, Hsiao-Wei Chang | 2019-04-30 |
| 9735002 | Integrated apparatus for efficient removal of halogen residues from etched substrates | Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim | 2017-08-15 |
| 9159593 | Method of particle contaminant removal | David Mui, Mark Wilcoxson | 2015-10-13 |
| 8900374 | Method for substrate cleaning including movement of substrate below substrate cleaning module | Cheng-Yu Lin, Mark Wilcoxson, Russell Martin, Leon Ginzburg | 2014-12-02 |
| 8828145 | Method of particle contaminant removal | Yizhak Sabba, Seokmin Yun, Mark Wilcoxson, Dragan Podlesnik | 2014-09-09 |
| 8757177 | Multi-stage substrate cleaning method and apparatus | Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu Lin, Mark Wilcoxson, Leon Ginzburg | 2014-06-24 |
| 8317934 | Multi-stage substrate cleaning method and apparatus | Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu Lin, Mark Wilcoxson, Leon Ginzburg | 2012-11-27 |
| 8293023 | System and method for monitoring wafer stress | John C. Valcore, Jr., Cristian Paduraru | 2012-10-23 |
| 8101025 | Method for controlling corrosion of a substrate | Eu Jin Lim, Chungdee Pong, Changhun Lee, Guowen Ding | 2012-01-24 |
| 7849554 | Apparatus and system for cleaning substrate | Cheng-Yu Lin, Mark Wilcoxson, Russell Martin, Leon Ginzburg | 2010-12-14 |
| 7846347 | Method for removing a halogen-containing residue | James S. Papanu, Scott Williams, Matthew F. Davis | 2010-12-07 |
| 7655571 | Integrated method and apparatus for efficient removal of halogen residues from etched substrates | Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven M. Kim | 2010-02-02 |
| 7648916 | Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal | Elizabeth Pavel, James S. Papanu | 2010-01-19 |
| 7604708 | Cleaning of native oxide with hydrogen-containing radicals | Bingxi Wood, James S. Papanu, Roderick C. Mosely, Chiukun Steven Lai, Chien-Teh Kao +2 more | 2009-10-20 |
| 7374696 | Method and apparatus for removing a halogen-containing residue | James S. Papanu, Scott Williams, Matthew F. Davis | 2008-05-20 |
| 6991739 | Method of photoresist removal in the presence of a dielectric layer having a low k-value | Huong Nguyen, Nikolaos Bekiaris, James S. Papanu | 2006-01-31 |