Issued Patents All Time
Showing 25 most recent of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12381065 | Methods and apparatus for controlling plasma in a plasma processing system | Bradford J. Lyndaker | 2025-08-05 |
| 12322572 | Systems and methods for tuning a MHz RF generator within a cycle of operation of a kHz RF generator | Arthur M. Howald | 2025-06-03 |
| 12217940 | Sensor data compression in a plasma tool | Travis Joseph Wong, Ying Wu, Sandeep Mudunuri, Bostjan Pust | 2025-02-04 |
| 11929235 | Systems and methods for tuning a MHz RF generator within a cycle of operation of a kHZ RF generator | Arthur M. Howald | 2024-03-12 |
| 11798784 | Methods and apparatus for controlling plasma in a plasma processing system | Bradford J. Lyndaker | 2023-10-24 |
| 11361942 | Adjustment of power and frequency based on three or more states | Bradford J. Lyndaker | 2022-06-14 |
| 10950421 | Using modeling for identifying a location of a fault in an RF transmission system for a plasma system | — | 2021-03-16 |
| 10911081 | Systems and methods for reducing power reflected towards a higher frequency RF generator during a period of a lower RF generator and for using a relationship to reduce reflected power | Arthur M. Howald, Andrew Fong, David Hopkins | 2021-02-02 |
| 10853444 | Systems and methods for tuning an impedance matching network in a step-wise fashion | Arthur M. Howald, Andrew Fong, David Hopkins | 2020-12-01 |
| 10832979 | Feedback control system for iterative etch process | Arthur M. Howald, Henry Povolny | 2020-11-10 |
| 10762266 | Segmenting a model within a plasma system | Arthur M. Howald | 2020-09-01 |
| 10748748 | RF impedance model based fault detection | James Rogers, Nicholas Webb, Peter Muraoka | 2020-08-18 |
| 10707056 | Using modeling to determine ion energy associated with a plasma system | Bradford J. Lyndaker | 2020-07-07 |
| 10629413 | Adjustment of power and frequency based on three or more states | Bradford J. Lyndaker | 2020-04-21 |
| 10621265 | Systems and methods for tuning an impedance matching network in a step-wise fashion | Arthur M. Howald, Andrew Fong, David Hopkins | 2020-04-14 |
| 10536183 | Dual push between a host computer system and an RF generator | Tony San, Andrew Fong | 2020-01-14 |
| 10474780 | Segmenting a model within a plasma system | Arthur M. Howald | 2019-11-12 |
| 10469108 | Systems and methods for using computer-generated models to reduce reflected power towards a high frequency RF generator during a cycle of operations of a low frequency RF generator | Arthur M. Howald, Andrew Fong, David Hopkins | 2019-11-05 |
| 10432248 | RF metrology system for a substrate processing apparatus incorporating RF sensors with corresponding lock-in amplifiers | Ernest Beauel Hanks | 2019-10-01 |
| 10403482 | Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator | Arthur M. Howald, Andrew Fong, David Hopkins | 2019-09-03 |
| 10381201 | Control of etch rate using modeling, feedback and impedance match | Bradford J. Lyndaker, Seyed Jafar Jafarian-Tehrani, Zhigang Chen, Alexei Marakhtanov | 2019-08-13 |
| 10366869 | Active feedback control of subsystems of a process module | Scott Riggs, Ryan Bise, Eric A. Hudson, Ranadeep Bhowmick | 2019-07-30 |
| 10340127 | Using modeling to determine wafer bias associated with a plasma system | Bradford J. Lyndaker | 2019-07-02 |
| 10325760 | System, method and apparatus for using optical data to monitor RF generator operations | Tony San, Seonkyung Lee | 2019-06-18 |
| 10325759 | Multiple control modes | Eric A. Hudson, Ryan Bise | 2019-06-18 |