Issued Patents All Time
Showing 25 most recent of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424410 | RF pulsing within pulsing for semiconductor RF plasma processing | Maolin Long, Yuhou Wang, Alex Paterson | 2025-09-23 |
| 12300463 | Method and system for automated frequency tuning of radiofrequency (RF) signal generator for multi-level RF power pulsing | Mathew Evans, Alexander Paterson | 2025-05-13 |
| 12283461 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Alex Paterson | 2025-04-22 |
| 12283463 | Systems and methods for multi-level pulsing in RF plasma tools | Maolin Long, John Drewery, Vikram Singh | 2025-04-22 |
| 12217940 | Sensor data compression in a plasma tool | John C. Valcore, Jr., Travis Joseph Wong, Sandeep Mudunuri, Bostjan Pust | 2025-02-04 |
| 12165872 | Methods and systems for advanced ion control for etching processes | Zhongkui Tan, Qian Fu, Qing Xu, John Drewery | 2024-12-10 |
| 12119232 | Etching isolation features and dense features within a substrate | Juline Shoeb, Alexander Paterson | 2024-10-15 |
| 12068131 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Alex Paterson | 2024-08-20 |
| 12046450 | Synchronization of RF generators | John Drewery, Alexander Paterson, Xiang Zhou, Zhuoxian Wang, Yoshie Kimura | 2024-07-23 |
| 11915912 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Alex Paterson | 2024-02-27 |
| 11798785 | Systems for reverse pulsing | Maolin Long, Zhongkui Tan, Qian Fu, Alex Paterson, John Drewery | 2023-10-24 |
| 11728136 | RF pulsing within pulsing for semiconductor RF plasma processing | Maolin Long, Yuhou Wang, Alex Paterson | 2023-08-15 |
| 11728137 | Direct frequency tuning for matchless plasma source in substrate processing systems | Yuhou Wang, Maolin Long, Alexander Paterson | 2023-08-15 |
| 11569067 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Alex Paterson | 2023-01-31 |
| 11462390 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Alex Paterson | 2022-10-04 |
| 11437219 | Frequency tuning for a matchless plasma source | Maolin Long, Yuhou Wang, Alex Paterson | 2022-09-06 |
| 11398387 | Etching isolation features and dense features within a substrate | Juline Shoeb, Alexander Paterson | 2022-07-26 |
| 11342159 | RF pulsing within pulsing for semiconductor RF plasma processing | Maolin Long, Yuhou Wang, Alex Paterson | 2022-05-24 |
| 11049726 | Methods and systems for advanced ion control for etching processes | Zhongkui Tan, Qian Fu, Qing Xu, John Drewery | 2021-06-29 |
| 11049693 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Alex Paterson | 2021-06-29 |
| 11011351 | Monoenergetic ion generation for controlled etch | Juline Shoeb, Alexander Paterson | 2021-05-18 |
| 10943789 | Methods and systems for advanced ion control for etching processes | Zhongkui Tan, Qian Fu, Qing Xu, John Drewery | 2021-03-09 |
| 10879044 | Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing | Yuhou Wang, Arthur H. Sato, Alexander Paterson | 2020-12-29 |
| 10755896 | Multi-level pulsing of DC and RF signals | Juline Shoeb, Alex Paterson | 2020-08-25 |
| 10679825 | Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate | Alex Paterson, John Drewery, Arthur H. Sato | 2020-06-09 |