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Home › Lam Research › Maolin Long

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Maolin Long — 63 Patents

Lam Research: 42 patents #41 of 2,128Top 2%

BCBeijing E-Town Semiconductor Technology Co.: 14 patents #6 of 72Top 9%

MTMattson Technology: 14 patents #9 of 230Top 4%

TLTokyo Electron Limited: 5 patents #1,450 of 5,567Top 30%

Applied Materials: 1 patents #4,824 of 7,310Top 70%

Huawei: 1 patents #8,318 of 15,535Top 55%

Santa Clara, CA: #141 of 9,301 inventorsTop 2%

California: #5,396 of 386,348 inventorsTop 2%

Overall (All Time): #35,470 of 4,157,543Top 1%

63 Patents All Time

Maolin Long has been granted 63 US patents while listed as an inventor at Lam Research. The first was granted in 2004 and the most recent in September 2025. Maolin Long ranks #35,470 of 4,157,543 US inventors in our database (top 0.85%). Patent records list Maolin Long in Santa Clara, CA, US.

Patents per Year

Issued Patents All Time

Showing 1–25 of 63 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
12424410	RF pulsing within pulsing for semiconductor RF plasma processing	Yuhou Wang, Ying Wu, Alex Paterson	2025-09-23
12417900	Plasma processing apparatus	Weimin Zeng, Yu Guan	2025-09-16
12400831	Dual frequency matching circuit for inductively coupled plasma (ICP) loads	—	2025-08-26
12347661	Pressure control system for a multi-head processing chamber of a plasma processing apparatus	Changle Guan, Junliang Li	2025-07-01
12340981	Workpiece processing apparatus with outer gas channel insert	Weimin Zeng	2025-06-24
12334312	Configurable faraday shield	—	2025-06-17
12322579	Metal contamination reduction in substrate processing systems with transformer coupled plasma	Neema Rastgar, Alexander Paterson	2025-06-03
12283463	Systems and methods for multi-level pulsing in RF plasma tools	Ying Wu, John Drewery, Vikram Singh	2025-04-22
12283467	Plasma strip tool with movable insert	Qiqun Zhang	2025-04-22
12266503	Hybrid plasma source array	—	2025-04-01
12261073	Electrostatic chuck assembly for plasma processing apparatus	—	2025-03-25
12261029	Protection system for switches in direct drive circuits of substrate processing systems	Yuhou Wang, Michael J. Martin, Alexander Paterson	2025-03-25
12193138	Matchless plasma source for semiconductor wafer fabrication	Yuhou Wang, Ricky Marsh, Alex Paterson	2025-01-07
12165841	Dual-frequency, direct-drive inductively coupled plasma source	Yuhou Wang, Alexander Paterson	2024-12-10	$119,772,000
12159770	Cooled shield for ICP source	—	2024-12-03
12119254	Electrostatic chuck assembly for plasma processing apparatus	Weimin Zeng	2024-10-15
12106947	RF reference measuring circuit for a direct drive system supplying power to generate plasma in a substrate processing system	—	2024-10-01	$207,578,000
12040159	Dual frequency matching circuit for inductively coupled plasma (ICP) loads	—	2024-07-16
12009184	Lift pin assembly for a plasma processing apparatus	Changle Guan	2024-06-11
12002701	Electrostatic chuck assembly for plasma processing apparatus	—	2024-06-04
11837493	Electrostatic chuck assembly for plasma processing apparatus	Weimin Zeng	2023-12-05
11798785	Systems for reverse pulsing	Zhongkui Tan, Ying Wu, Qian Fu, Alex Paterson, John Drewery	2023-10-24	$152,530,000
11728137	Direct frequency tuning for matchless plasma source in substrate processing systems	Yuhou Wang, Ying Wu, Alexander Paterson	2023-08-15	$186,018,000
11728136	RF pulsing within pulsing for semiconductor RF plasma processing	Yuhou Wang, Ying Wu, Alex Paterson	2023-08-15	$186,018,000
11716805	Matchless plasma source for semiconductor wafer fabrication	Yuhou Wang, Ricky Marsh, Alex Paterson	2023-08-01	$804,168,000