Issued Patents All Time
Showing 25 most recent of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424410 | RF pulsing within pulsing for semiconductor RF plasma processing | Yuhou Wang, Ying Wu, Alex Paterson | 2025-09-23 |
| 12417900 | Plasma processing apparatus | Weimin Zeng, Yu Guan | 2025-09-16 |
| 12400831 | Dual frequency matching circuit for inductively coupled plasma (ICP) loads | — | 2025-08-26 |
| 12347661 | Pressure control system for a multi-head processing chamber of a plasma processing apparatus | Changle Guan, Junliang Li | 2025-07-01 |
| 12340981 | Workpiece processing apparatus with outer gas channel insert | Weimin Zeng | 2025-06-24 |
| 12334312 | Configurable faraday shield | — | 2025-06-17 |
| 12322579 | Metal contamination reduction in substrate processing systems with transformer coupled plasma | Neema Rastgar, Alexander Paterson | 2025-06-03 |
| 12283463 | Systems and methods for multi-level pulsing in RF plasma tools | Ying Wu, John Drewery, Vikram Singh | 2025-04-22 |
| 12283467 | Plasma strip tool with movable insert | Qiqun Zhang | 2025-04-22 |
| 12266503 | Hybrid plasma source array | — | 2025-04-01 |
| 12261029 | Protection system for switches in direct drive circuits of substrate processing systems | Yuhou Wang, Michael J. Martin, Alexander Paterson | 2025-03-25 |
| 12261073 | Electrostatic chuck assembly for plasma processing apparatus | — | 2025-03-25 |
| 12193138 | Matchless plasma source for semiconductor wafer fabrication | Yuhou Wang, Ricky Marsh, Alex Paterson | 2025-01-07 |
| 12165841 | Dual-frequency, direct-drive inductively coupled plasma source | Yuhou Wang, Alexander Paterson | 2024-12-10 |
| 12159770 | Cooled shield for ICP source | — | 2024-12-03 |
| 12119254 | Electrostatic chuck assembly for plasma processing apparatus | Weimin Zeng | 2024-10-15 |
| 12106947 | RF reference measuring circuit for a direct drive system supplying power to generate plasma in a substrate processing system | — | 2024-10-01 |
| 12040159 | Dual frequency matching circuit for inductively coupled plasma (ICP) loads | — | 2024-07-16 |
| 12009184 | Lift pin assembly for a plasma processing apparatus | Changle Guan | 2024-06-11 |
| 12002701 | Electrostatic chuck assembly for plasma processing apparatus | — | 2024-06-04 |
| 11837493 | Electrostatic chuck assembly for plasma processing apparatus | Weimin Zeng | 2023-12-05 |
| 11798785 | Systems for reverse pulsing | Zhongkui Tan, Ying Wu, Qian Fu, Alex Paterson, John Drewery | 2023-10-24 |
| 11728136 | RF pulsing within pulsing for semiconductor RF plasma processing | Yuhou Wang, Ying Wu, Alex Paterson | 2023-08-15 |
| 11728137 | Direct frequency tuning for matchless plasma source in substrate processing systems | Yuhou Wang, Ying Wu, Alexander Paterson | 2023-08-15 |
| 11716805 | Matchless plasma source for semiconductor wafer fabrication | Yuhou Wang, Ricky Marsh, Alex Paterson | 2023-08-01 |