Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Metal contamination reduction in substrate processing systems with transformer coupled plasma

Metal contamination reduction in substrate processing systems with transformer coupled plasma

US Patent 12322579 · Granted Jun 3, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

RF pulsing within pulsing for semiconductor RF plasma processing2025
Plasma processing apparatus2025
Substrate location detection and adjustment2025
Dual frequency matching circuit for inductively coupled plasma (ICP) loads2025
Pressure control system for a multi-head processing chamber of a plasma processi2025
Workpiece processing apparatus with outer gas channel insert2025
Configurable faraday shield2025
Method and system for automated frequency tuning of radiofrequency (RF) signal g2025
Systems and methods for multi-level pulsing in RF plasma tools2025
Plasma strip tool with movable insert2025
Hybrid plasma source array2025
Protection system for switches in direct drive circuits of substrate processing 2025