Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dual-frequency, direct-drive inductively coupled plasma source

Dual-frequency, direct-drive inductively coupled plasma source

US Patent 12165841 · Granted Dec 10, 2024

Estimated economic value: $119,772,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Robust dispatch method for flexibility resources of large-scale data center micr2025
RF pulsing within pulsing for semiconductor RF plasma processing2025
RF pulsing within pulsing for semiconductor RF plasma processing2025
Plasma processing apparatus2025
Substrate location detection and adjustment2025
Substrate location detection and adjustment2025
Dual frequency matching circuit for inductively coupled plasma (ICP) loads2025
Pressure control system for a multi-head processing chamber of a plasma processi2025
Workpiece processing apparatus with outer gas channel insert2025
Configurable faraday shield2025
Metal contamination reduction in substrate processing systems with transformer c2025
Metal contamination reduction in substrate processing systems with transformer c2025