Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12125711 | Reducing roughness of extreme ultraviolet lithography resists | Teng Hooi Goh, Yoshie Kimura | 2024-10-22 |
| 12046450 | Synchronization of RF generators | Ying Wu, John Drewery, Alexander Paterson, Zhuoxian Wang, Yoshie Kimura | 2024-07-23 |
| 11798987 | Substrate for a controlled implantation of ions and method of preparing a substrate for a controlled implantation of ions | Ivo Rangelow, Dimitre Karpuzov | 2023-10-24 |
| 11211253 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Yoshie Kimura, Duming Zhang, Chen Xu, Ganesh Upadhyaya, Mitchell Brooks | 2021-12-28 |
| 11170997 | Atomic layer deposition and etch for reducing roughness | Naveed Ansari, Yoshie Kimura, Si Yi Li, Kazi Sultana, Radhika Mani +5 more | 2021-11-09 |
| 10950454 | Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method | Tom A. Kamp, Yoshie Kimura, Duming Zhang, Chen Xu, John Drewery +1 more | 2021-03-16 |
| 10734238 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Yoshie Kimura, Duming Zhang, Chen Xu, Ganesh Upadhyaya, Mitchell Brooks | 2020-08-04 |
| 10658174 | Atomic layer deposition and etch for reducing roughness | Naveed Ansari, Yoshie Kimura, Si Yi Li, Kazi Sultana, Radhika Mani +5 more | 2020-05-19 |
| 10515815 | Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation | Ganesh Upadhyaya, Yoshie Kimura, Weiye Zhu, Zhaohong Han, Seokhwan Lee +1 more | 2019-12-24 |