Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211253 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Xiang Zhou, Yoshie Kimura, Duming Zhang, Chen Xu, Mitchell Brooks | 2021-12-28 |
| 11170997 | Atomic layer deposition and etch for reducing roughness | Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si Yi Li, Kazi Sultana +5 more | 2021-11-09 |
| 10734238 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Xiang Zhou, Yoshie Kimura, Duming Zhang, Chen Xu, Mitchell Brooks | 2020-08-04 |
| 10658174 | Atomic layer deposition and etch for reducing roughness | Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si Yi Li, Kazi Sultana +5 more | 2020-05-19 |
| 10515815 | Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation | Xiang Zhou, Yoshie Kimura, Weiye Zhu, Zhaohong Han, Seokhwan Lee +1 more | 2019-12-24 |
| 9466466 | Determination of semiconductor chamber operating parameters for the optimization of critical dimension uniformity | Qinghua Zhong, Ryan Martin | 2016-10-11 |
| 9385003 | Residue free systems and methods for isotropically etching silicon in tight spaces | Ming-Shu KUO, Qinghua Zhong, Helene Del Puppo, Gowri Kamarthy | 2016-07-05 |
| 9252238 | Semiconductor structures with coplanar recessed gate layers and fabrication methods | Kristina Trevino, Yuan-Hung Liu, Gabriel Padron Wells, Xing Zhang, Hoong Shing Wong +4 more | 2016-02-02 |
| 8431461 | Silicon nitride dry trim without top pulldown | Qinghua Zhong, Yoshie Kimura, Tae Won Kim, Qian Fu, Gladys So-Wan Lo +1 more | 2013-04-30 |