Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7550851 | Adhesion of tungsten nitride films to a silicon surface | Dennis M. Hausmann | 2009-06-23 |
| 7244672 | Selective etching of organosilicate films over silicon oxide stop etch layers | Michael Barnes, Li-Qun Xia, Mehul Naik | 2007-07-17 |
| 7183201 | Selective etching of organosilicate films over silicon oxide stop etch layers | Michael Barnes, Li-Qun Xia, Mehul Naik | 2007-02-27 |
| 7160802 | Adhesion of tungsten nitride films to a silicon surface | Dennis M. Hausmann | 2007-01-09 |
| 7097716 | Method for performing fluorocarbon chamber cleaning to eliminate fluorine memory effect | Michael Barnes | 2006-08-29 |
| 6991739 | Method of photoresist removal in the presence of a dielectric layer having a low k-value | Mark Kawaguchi, Nikolaos Bekiaris, James S. Papanu | 2006-01-31 |
| 6939434 | Externally excited torroidal plasma source with magnetic control of ion distribution | Kenneth S. Collins, Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen +1 more | 2005-09-06 |
| 6680164 | Solvent free photoresist strip and residue removal processing for post etching of low-k films | Mark Kawaguchi, Mehul Naik, Li-Qun Xia, Ellie Yieh | 2004-01-20 |
| 6626185 | Method of depositing a silicon containing layer on a semiconductor substrate | Alex Demos, Paul Shufflebotham, Michael Barnes, Brian McMillin, Monique Ben-Dor | 2003-09-30 |
| 6569257 | Method for cleaning a process chamber | Michael Barnes, Li-Qun Xia, Ellie Yieh | 2003-05-27 |
| 6521546 | Method of making a fluoro-organosilicate layer | Michael Barnes, Hichem M'Saad, Farhad Moghadam | 2003-02-18 |
| 6514850 | Interface with dielectric layer and method of making | Li-Qun Xia, Ellie Yieh, Dan Maydan | 2003-02-04 |
| 6511920 | Optical marker layer for etch endpoint determination | Yunsang Kim, Ellie Yieh, Li-Qun Xia | 2003-01-28 |
| 6270862 | Method for high density plasma chemical vapor deposition of dielectric films | Brian McMillin, Michael Barnes, Butch Berney | 2001-08-07 |
| 6258735 | Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber | Li-Qun Xia, Tian-Hoe Lim, Dian Sugiarto | 2001-07-10 |
| 6184158 | Inductively coupled plasma CVD | Paul Shufflebotham, Brian McMillin, Alex Demos, Butch Berney, Monique Ben-Dor | 2001-02-06 |
| 6013155 | Gas injection system for plasma processing | Brian McMillin, Michael Barnes, Tom Ni | 2000-01-11 |
| 5835334 | Variable high temperature chuck for high density plasma chemical vapor deposition | Brian McMillin, Michael Barnes, Butch Berney | 1998-11-10 |