| 8143174 |
Post-deposition treatment to enhance properties of Si-O-C low K films |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2012-03-27 |
| 7326657 |
Post-deposition treatment to enhance properties of Si-O-C low k films |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2008-02-05 |
| 7074708 |
Method of decreasing the k value in sioc layer deposited by chemical vapor deposition |
Frederic Gaillard, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau, Shin-Puu Jeng +2 more |
2006-07-11 |
| 6899763 |
Lid cooling mechanism and method for optimized deposition of low-K dielectric using TR methylsilane-ozone based processes |
Himansu Pokharna, Li-Qun Xia |
2005-05-31 |
| 6858923 |
Post-deposition treatment to enhance properties of Si-O-C low films |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2005-02-22 |
| 6784119 |
Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition |
Frederic Gaillard, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau, Shin-Puu Jeng +2 more |
2004-08-31 |
| 6635575 |
Methods and apparatus to enhance properties of Si-O-C low K films |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2003-10-21 |
| 6632478 |
Process for forming a low dielectric constant carbon-containing film |
Frederic Gaillard, Li-Qun Xia, Jen Shu, Ellie Yieh |
2003-10-14 |
| 6627532 |
Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
Frederic Gaillard, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau, Shin-Puu Jeng +2 more |
2003-09-30 |
| 6614181 |
UV radiation source for densification of CVD carbon-doped silicon oxide films |
Keith Harvey, Li-Qun Xia |
2003-09-02 |
| 6602806 |
Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film |
Li-Qun Xia, Fabrice Geiger, Frederic Gaillard, Ellie Yieh |
2003-08-05 |
| 6583497 |
Surface treatment of c-doped SiO2 film to enhance film stability during O2 ashing |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2003-06-24 |
| 6573196 |
Method of depositing organosilicate layers |
Frederick Gaillard, Li-Qun Xia, Ellie Yieh |
2003-06-03 |
| 6566278 |
Method for densification of CVD carbon-doped silicon oxide films through UV irradiation |
Keith Harvey, Li-Qun Xia |
2003-05-20 |
| 6528116 |
Lid cooling mechanism and method for optimized deposition of low-k dielectric using tri methylsilane-ozone based processes |
Himansu Pokharna, Li-Qun Xia |
2003-03-04 |
| 6486061 |
Post-deposition treatment to enhance properties of Si-O-C low K films |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2002-11-26 |
| 6465372 |
Surface treatment of C-doped SiO2 film to enhance film stability during O2 ashing |
Li-Qun Xia, Frederic Gaillard, Ellie Yieh |
2002-10-15 |
| 6258735 |
Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber |
Li-Qun Xia, Huong Nguyen, Dian Sugiarto |
2001-07-10 |
| 6255222 |
Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process |
Li-Qun Xia, Himanshu Pokharrna |
2001-07-03 |
