Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347650 | Substrate processing system including dual ion filter for downstream plasma | Chih-Hsun Hsu, Serge Kosche, Stephen Whitten, Shih-Chung Kon, Mark Kawaguchi +3 more | 2025-07-01 |
| 11967486 | Substrate processing system including dual ion filter for downstream plasma | Chih-Hsun Hsu, Serge Kosche, Stephen Whitten, Shih-Chung Kon, Mark Kawaguchi +3 more | 2024-04-23 |
| 10622189 | Adjustable side gas plenum for edge rate control in a downstream reactor | Joydeep Guha, Jatinder Kumar | 2020-04-14 |
| 9601319 | Systems and methods for eliminating flourine residue in a substrate processing chamber using a plasma-based process | Joydeep Guha, Amit Pharkya | 2017-03-21 |