Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6949460 | Line edge roughness reduction for trench etch | Helen Zhu, Daniel Le, Peter Loewenhardt | 2005-09-27 |
| 6630407 | Plasma etching of organic antireflective coating | Douglas Keil, Jim Bowers, Rao Annapragada, Tri C. Le | 2003-10-07 |
| 6540885 | Profile control of oxide trench features for dual damascene applications | Douglas Keil, Bryan A. Helmer | 2003-04-01 |
| 6146986 | Lithographic method for creating damascene metallization layers | — | 2000-11-14 |