AD

Alexander Dulkin

NS Novellus Systems: 8 patents #108 of 780Top 15%
Lam Research: 3 patents #812 of 2,128Top 40%
📍 Sunnyvale, CA: #2,524 of 14,302 inventorsTop 20%
🗺 California: #55,401 of 386,348 inventorsTop 15%
Overall (All Time): #449,268 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
11832533 Conformal damage-free encapsulation of chalcogenide materials James S. Sims, Andrew John McKerrow, Meihua Shen, Thorsten Lill, Shane Tang +4 more 2023-11-28
11239420 Conformal damage-free encapsulation of chalcogenide materials James S. Sims, Andrew John McKerrow, Meihua Shen, Thorsten Lill, Shane Tang +4 more 2022-02-01
10153282 Ultra-high vacuum transport and storage Theodoros Panagopoulos, Richard H. Gould, Edmundo Reyes, John D. Boniface, Ivan L. Berry, III +1 more 2018-12-11
8449731 Method and apparatus for increasing local plasma density in magnetically confined plasma Anshu A. Pradhan, Douglas B. Hayden, Ronald L. Kinder 2013-05-28
8343318 Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process Karl Leeser, Ishtak Karim 2013-01-01
7964504 PVD-based metallization methods for fabrication of interconnections in semiconductor devices Roey Shaviv, Daniel R. Juliano, Ronald L. Kinder 2011-06-21
7922880 Method and apparatus for increasing local plasma density in magnetically confined plasma Anshu A. Pradhan, Douglas B. Hayden, Ronald L. Kinder 2011-04-12
7855147 Methods and apparatus for engineering an interface between a diffusion barrier layer and a seed layer Asit Rairkar, Frank Greer, Anshu A. Pradhan, Robert T. Rozbicki 2010-12-21
7745332 PVD-based metallization methods for fabrication of interconnections in semiconductor devices Roey Shaviv, Neil Mackie, Daniel R. Juliano, Robert T. Rozbicki 2010-06-29
7645696 Deposition of thin continuous PVD seed layers having improved adhesion to the barrier layer Anil Vijayendran, Tom Yu, Daniel R. Juliano 2010-01-12
6566246 Deposition of conformal copper seed layers by control of barrier layer morphology Tarek Suwwan de Felipe, Michal Danek, Erich R. Klawuhn 2003-05-20