Issued Patents All Time
Showing 51–75 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6680420 | Apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, William Taylor, Sebastien Raoux, Mark Fodor | 2004-01-20 |
| 6669858 | Integrated low k dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, Wai-Fan Yau, Kuowei Liu +7 more | 2003-12-30 |
| 6660663 | Computer readable medium for holding a program for performing plasma-assisted CVD of low dielectric constant films formed from organosilane compounds | Wai-Fan Yau, Robert R. Mandal | 2003-12-09 |
| 6660656 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2003-12-09 |
| 6632735 | Method of depositing low dielectric constant carbon doped silicon oxide | Wai-Fan Yau, Ju-Hyung Lee, Nasreen Chopra, Tzu-Fang Huang, Farhad Moghadam +5 more | 2003-10-14 |
| 6596655 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2003-07-22 |
| 6593247 | Method of depositing low k films using an oxidizing plasma | Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more | 2003-07-15 |
| 6562690 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2003-05-13 |
| 6562544 | Method and apparatus for improving accuracy in photolithographic processing of substrates | Joe Feng, Judy H. Huang, Wai-Fan Yau | 2003-05-13 |
| 6541282 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2003-04-01 |
| 6537929 | CVD plasma assisted low dielectric constant films | Wai-Fan Yau, Robert R. Mandal | 2003-03-25 |
| 6517913 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | Sebastien Raoux, Judy H. Huang, William Taylor, Mark Fodor, Kevin Fairbairn | 2003-02-11 |
| 6511903 | Method of depositing a low k dielectric with organo silane | Wai-Fan Yau, Shin-Puu Jeng, Kuowei Liu, Yung-Cheng Yu | 2003-01-28 |
| 6511909 | Method of depositing a low K dielectric with organo silane | Wai-Fan Yau, Shin-Puu Jeng, Kuowei Liu, Yung-Cheng Yu | 2003-01-28 |
| 6448187 | Method of improving moisture resistance of low dielectric constant films | Wai-Fan Yau, Nasreen Chopra, Yung-Cheng Lu, Robert P. Mandal, Farhad Moghadam | 2002-09-10 |
| 6413583 | Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound | Farhad Moghadam, Ellie Yieh, Li-Qun Xia, Wai-Fan Yau, Chi-I Lang +4 more | 2002-07-02 |
| 6395092 | Apparatus for depositing high deposition rate halogen-doped silicon oxide layer | Dian Sugiarto, Judy H. Huang | 2002-05-28 |
| 6361707 | Apparatus and methods for upgraded substrate processing system with microwave plasma source | Tsutomu Tanaka, Mukul Kelkar, Kevin Fairbairn, Hari Ponnekanti | 2002-03-26 |
| 6358573 | Mixed frequency CVD process | Sebastien Raoux, Mandar Mudholkar, William Taylor, Mark Fodor, Judy H. Huang +2 more | 2002-03-19 |
| 6348725 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2002-02-19 |
| 6340435 | Integrated low K dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, Wai-Fan Yau, Kuowei Liu +7 more | 2002-01-22 |
| 6324439 | Method and apparatus for applying films using reduced deposition rates | Joe Feng, Madhu Deshpande, Wai-Fan Yau, Judy H. Huang | 2001-11-27 |
| 6303523 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2001-10-16 |
| 6287990 | CVD plasma assisted low dielectric constant films | Wai-Fan Yau, Robert R. Mandal | 2001-09-11 |
| 6245690 | Method of improving moisture resistance of low dielectric constant films | Wai-Fan Yau, Nasreen Chopra, Yung-Cheng Lu, Robert P. Mandal, Farhad Moghadam | 2001-06-12 |