KL

Kuo-Wei Liu

Applied Materials: 11 patents #1,198 of 7,310Top 20%
Overall (All Time): #469,003 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7560377 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2009-07-14
6930061 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2005-08-16
6869896 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2005-03-22
6734115 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2004-05-11
6660656 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2003-12-09
6632735 Method of depositing low dielectric constant carbon doped silicon oxide Wai-Fan Yau, Ju-Hyung Lee, Nasreen Chopra, Tzu-Fang Huang, David Cheung +5 more 2003-10-14
6596655 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2003-07-22
6562690 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2003-05-13
6541282 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2003-04-01
6348725 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2002-02-19
6303523 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Yung-Cheng Lu +5 more 2001-10-16