Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7651725 | Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2010-01-26 |
| 7227244 | Integrated low k dielectrics and etch stops | Claes Bjorkman, Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2007-06-05 |
| 7160821 | Method of depositing low k films | Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more | 2007-01-09 |
| 7074708 | Method of decreasing the k value in sioc layer deposited by chemical vapor deposition | Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau +2 more | 2006-07-11 |
| 7023092 | Low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2006-04-04 |
| 6858153 | Integrated low K dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2005-02-22 |
| 6806207 | Method of depositing low K films | Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more | 2004-10-19 |
| 6784119 | Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition | Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau +2 more | 2004-08-31 |
| 6770556 | Method of depositing a low dielectric with organo silane | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2004-08-03 |
| 6730593 | Method of depositing a low K dielectric with organo silane | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2004-05-04 |
| 6669858 | Integrated low k dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2003-12-30 |
| 6627532 | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition | Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau +2 more | 2003-09-30 |
| 6593247 | Method of depositing low k films using an oxidizing plasma | Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more | 2003-07-15 |
| 6511909 | Method of depositing a low K dielectric with organo silane | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2003-01-28 |
| 6511903 | Method of depositing a low k dielectric with organo silane | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2003-01-28 |
| 6340435 | Integrated low K dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2002-01-22 |
| 6072227 | Low power method of depositing a low k dielectric with organo silane | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2000-06-06 |
| 6054379 | Method of depositing a low k dielectric with organo silane | Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu | 2000-04-25 |