KL

Kuowei Liu

Applied Materials: 18 patents #731 of 7,310Top 10%
Overall (All Time): #258,941 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7651725 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2010-01-26
7227244 Integrated low k dielectrics and etch stops Claes Bjorkman, Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more 2007-06-05
7160821 Method of depositing low k films Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more 2007-01-09
7074708 Method of decreasing the k value in sioc layer deposited by chemical vapor deposition Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau +2 more 2006-07-11
7023092 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2006-04-04
6858153 Integrated low K dielectrics and etch stops Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more 2005-02-22
6806207 Method of depositing low K films Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more 2004-10-19
6784119 Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau +2 more 2004-08-31
6770556 Method of depositing a low dielectric with organo silane Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2004-08-03
6730593 Method of depositing a low K dielectric with organo silane Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2004-05-04
6669858 Integrated low k dielectrics and etch stops Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more 2003-12-30
6627532 Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau +2 more 2003-09-30
6593247 Method of depositing low k films using an oxidizing plasma Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more 2003-07-15
6511909 Method of depositing a low K dielectric with organo silane Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2003-01-28
6511903 Method of depositing a low k dielectric with organo silane Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2003-01-28
6340435 Integrated low K dielectrics and etch stops Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more 2002-01-22
6072227 Low power method of depositing a low k dielectric with organo silane Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2000-06-06
6054379 Method of depositing a low k dielectric with organo silane Wai-Fan Yau, David Cheung, Shin-Puu Jeng, Yung-Cheng Yu 2000-04-25