Issued Patents All Time
Showing 76–100 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6230652 | Apparatus and methods for upgraded substrate processing system with microwave plasma source | Tsutomu Tanaka, Mukul Kelkar, Kevin Fairbairn, Hari Ponnekanti | 2001-05-15 |
| 6209484 | Method and apparatus for depositing an etch stop layer | Judy H. Huang, Wai-Fan Yau, Chan-Lon Yang | 2001-04-03 |
| 6194628 | Method and apparatus for cleaning a vacuum line in a CVD system | Ben Pang, William Taylor, Sebastien Raoux, Mark Fodor | 2001-02-27 |
| 6193802 | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment | Ben Pang, William Taylor, Sebastien Raoux, Mark Fodor | 2001-02-27 |
| 6187072 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | Sebastien Raoux, Judy H. Huang, William Taylor, Mark Fodor, Kevin Fairbairn | 2001-02-13 |
| 6171945 | CVD nanoporous silica low dielectric constant films | Robert P. Mandal, Wai-Fan Yau | 2001-01-09 |
| 6156149 | In situ deposition of a dielectric oxide layer and anti-reflective coating | Judy H. Huang, Wai-Fan Yau | 2000-12-05 |
| 6127262 | Method and apparatus for depositing an etch stop layer | Judy H. Huang, Wai-Fan Yau, Chan-Lon Yang | 2000-10-03 |
| 6107184 | Nano-porous copolymer films having low dielectric constants | Robert P. Mandal, Peter Wai-Man Lee, Chi-I Lang | 2000-08-22 |
| 6098568 | Mixed frequency CVD apparatus | Sebastien Raoux, Mandar Mudholkar, William Taylor, Mark Fodor, Judy H. Huang +2 more | 2000-08-08 |
| 6086952 | Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer | Chi-I Lang, Yeming Jim Ma, Fong Chang, Peter Wai-Man Lee, Shin-Puu Jeng | 2000-07-11 |
| 6083852 | Method for applying films using reduced deposition rates | Joe Feng, Madhu Deshpande, Wai-Fan Yau, Judy H. Huang | 2000-07-04 |
| 6077764 | Process for depositing high deposition rate halogen-doped silicon oxide layer | Dian Sugiarto, Judy H. Huang | 2000-06-20 |
| 6072227 | Low power method of depositing a low k dielectric with organo silane | Wai-Fan Yau, Shin-Puu Jeng, Kuowei Liu, Yung-Cheng Yu | 2000-06-06 |
| 6054379 | Method of depositing a low k dielectric with organo silane | Wai-Fan Yau, Shin-Puu Jeng, Kuowei Liu, Yung-Cheng Yu | 2000-04-25 |
| 6045618 | Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment | Sebastien Raoux, Tsutomu Tanaka, Mukul Kelkar, Hari Ponnekanti, Kevin Fairbairn | 2000-04-04 |
| 6039834 | Apparatus and methods for upgraded substrate processing system with microwave plasma source | Tsutomu Tanaka, Mukul Kelkar, Kevin Fairbairn, Hari Ponnekanti | 2000-03-21 |
| 5968324 | Method and apparatus for depositing antireflective coating | Joe Feng, Judy H. Huang, Wai-Fan Yau | 1999-10-19 |
| 5911834 | Gas delivery system | Kevin Fairbairn, Hari Ponnekanti | 1999-06-15 |
| 5908672 | Method and apparatus for depositing a planarized passivation layer | Choon Kun Ryu, Judy H. Huang | 1999-06-01 |
| 5844195 | Remote plasma source | Kevin Fairbairn, Hari Ponnekanti, Tsutomu Tanaka, Malcal Kelka | 1998-12-01 |
| 5817406 | Ceramic susceptor with embedded metal electrode and brazing material connection | Mark Fodor, Christopher T. Lane, Ryusuke Ushikoshi, Hideyoshi Tsuruta, Tomoyuki Fujii | 1998-10-06 |
| 5792269 | Gas distribution for CVD systems | Thomas E. Deacon, Peter Wai-Man Lee, Judy H. Huang | 1998-08-11 |
| 5633073 | Ceramic susceptor with embedded metal electrode and eutectic connection | Mark Fodor, Christopher T. Lane, Harold Mortensen | 1997-05-27 |
| 5626678 | Non-conductive alignment member for uniform plasma processing of substrates | Turgut Sahin | 1997-05-06 |