Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11720030 | Low dose charged particle metrology system | Fei Wang, Wei Fang | 2023-08-08 |
| 11430631 | Methods of inspecting samples with multiple beams of charged particles | Xuedong Liu, Wei Fang, Jack Jau | 2022-08-30 |
| 11175590 | Low dose charged particle metrology system | Fei Wang, Wei Fang | 2021-11-16 |
| 8582079 | Using phase difference of interference lithography for resolution enhancement | Rudolf H. Hendel | 2013-11-12 |
| 6553932 | Reduction of plasma edge effect on plasma enhanced CVD processes | Ramana Veerasingam, Zhi Xu, Ping Xu, Mario D. Silvetti, Gang Chen | 2003-04-29 |
| 6170430 | Gas feedthrough with electrostatic discharge characteristic | Ernest Cheung, Prasanth Kumar, John Ferguson, Michael G. Friebe, Ashish Shrotriya +1 more | 2001-01-09 |