Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6436303 | Film removal employing a remote plasma source | Bok Heon Kim, Nam Le, Joseph D'Souza | 2002-08-20 |
| 6170430 | Gas feedthrough with electrostatic discharge characteristic | Kuo-Shih Liu, Ernest Cheung, Prasanth Kumar, John Ferguson, Michael G. Friebe +1 more | 2001-01-09 |
| 6068729 | Two step process for cleaning a substrate processing chamber | — | 2000-05-30 |
| 5895530 | Method and apparatus for directing fluid through a semiconductor processing chamber | Todd C. Bryant | 1999-04-20 |
| 5843239 | Two-step process for cleaning a substrate processing chamber | — | 1998-12-01 |