| 11626314 |
Lift pin assembly, an electrostatic chuck and a processing apparatus where the electrostatic chuck is located |
Tuqiang Ni, Rubin Ye, Jie Liang, Leyi Tu, Ziyang Wu |
2023-04-11 |
| 6170428 |
Symmetric tunable inductively coupled HDP-CVD reactor |
Fred C. Redeker, Farhad Moghadam, Hiroji Hanawa, Tetsuya Ishikawa, Dan Maydan +5 more |
2001-01-09 |
| 6083344 |
Multi-zone RF inductively coupled source configuration |
Hiroji Hanawa, Tetsuya Ishikawa, Shijian Li, Kaveh Niazi, Kenneth Smyth +3 more |
2000-07-04 |
| 5891253 |
Corrosion resistant apparatus |
Sandy M. Chew |
1999-04-06 |
| 5761023 |
Substrate support with pressure zones having reduced contact area and temperature feedback |
Brian Lue, Tetsuya Ishikawa, Fred C. Redeker, Shijian Li |
1998-06-02 |
| 5593541 |
Method of manufacturing using corrosion-resistant apparatus comprising rhodium |
Sandy M. Chew |
1997-01-14 |
| 5522932 |
Corrosion-resistant apparatus |
Sandy M. Chew |
1996-06-04 |
| 5522937 |
Welded susceptor assembly |
Sandy M. Chew, Dale R. DuBois, Ronald L. Rose |
1996-06-04 |
| 5332443 |
Lift fingers for substrate processing apparatus |
Sandy M. Chew, Shane D. Clark, Ron Rose, Dale R. DuBois, Cissy Leung +1 more |
1994-07-26 |
