Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7036453 | Apparatus for reducing plasma charge damage for plasma processes | Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Michio Aruga | 2006-05-02 |
| 6660662 | Method of reducing plasma charge damage for plasma processes | Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Michio Aruga | 2003-12-09 |
| 6447651 | High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers | Tetsuya Ishikawa, Tsutomu Tanaka, Canfeng Lai, Robert Duncan | 2002-09-10 |
| 6239553 | RF plasma source for material processing | Mike Barnes, Tetsuya Ishikawa, Tsutomu Tanaka | 2001-05-29 |
| 6189483 | Process kit | Tetsuya Ishikawa, Padmanabhan Krishnaraj, Hiroji Hanawa | 2001-02-20 |
| 6083344 | Multi-zone RF inductively coupled source configuration | Hiroji Hanawa, Tetsuya Ishikawa, Manus Wong, Shijian Li, Kenneth Smyth +3 more | 2000-07-04 |