MA

Michio Aruga

Applied Materials: 14 patents #962 of 7,310Top 15%
PS Pdf Solutions: 1 patents #76 of 143Top 55%
Overall (All Time): #315,111 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11687439 Automatic window generation for process trace Richard Burch, Kazuki Kunitoshi, Nobichika Akiya 2023-06-27
7036453 Apparatus for reducing plasma charge damage for plasma processes Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi 2006-05-02
6660662 Method of reducing plasma charge damage for plasma processes Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi 2003-12-09
6632726 Film formation method and film formation apparatus Atsushi Tabata 2003-10-14
6090706 Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein Susan Telford, Mei Chang 2000-07-18
5997950 Substrate having uniform tungsten silicide film and method of manufacture Susan G. Telford, Meng Chu Tseng, Klaus-Dieter Rinnen 1999-12-07
5877086 Metal planarization using a CVD wetting film 1999-03-02
5779848 Corrosion-resistant aluminum nitride coating for a semiconductor chamber window 1998-07-14
5688331 Resistance heated stem mounted aluminum susceptor assembly Atsunobu Ohkura, Akihiko Saito, Kenji Suzuki, Kenichi Taguchi, Dale R. DuBois +1 more 1997-11-18
5643633 Uniform tungsten silicide films produced by chemical vapor depostiton Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg 1997-07-01
5558910 Uniform tungsten silicide films produced by chemical vapor deposition Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg 1996-09-24
5510297 Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor Susan Telford, Mei Chang 1996-04-23
5500249 Uniform tungsten silicide films produced by chemical vapor deposition Susan G. Telford, Meng Chu Tseng 1996-03-19
5482749 Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein Susan Telford, Mei Chang 1996-01-09
5456757 Susceptor for vapor deposition Atsunobu Ohkuba, Akihiko Saito, Katsumasa Anan 1995-10-10