Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11687439 | Automatic window generation for process trace | Richard Burch, Kazuki Kunitoshi, Nobichika Akiya | 2023-06-27 |
| 7036453 | Apparatus for reducing plasma charge damage for plasma processes | Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi | 2006-05-02 |
| 6660662 | Method of reducing plasma charge damage for plasma processes | Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi | 2003-12-09 |
| 6632726 | Film formation method and film formation apparatus | Atsushi Tabata | 2003-10-14 |
| 6090706 | Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein | Susan Telford, Mei Chang | 2000-07-18 |
| 5997950 | Substrate having uniform tungsten silicide film and method of manufacture | Susan G. Telford, Meng Chu Tseng, Klaus-Dieter Rinnen | 1999-12-07 |
| 5877086 | Metal planarization using a CVD wetting film | — | 1999-03-02 |
| 5779848 | Corrosion-resistant aluminum nitride coating for a semiconductor chamber window | — | 1998-07-14 |
| 5688331 | Resistance heated stem mounted aluminum susceptor assembly | Atsunobu Ohkura, Akihiko Saito, Kenji Suzuki, Kenichi Taguchi, Dale R. DuBois +1 more | 1997-11-18 |
| 5643633 | Uniform tungsten silicide films produced by chemical vapor depostiton | Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg | 1997-07-01 |
| 5558910 | Uniform tungsten silicide films produced by chemical vapor deposition | Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg | 1996-09-24 |
| 5510297 | Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor | Susan Telford, Mei Chang | 1996-04-23 |
| 5500249 | Uniform tungsten silicide films produced by chemical vapor deposition | Susan G. Telford, Meng Chu Tseng | 1996-03-19 |
| 5482749 | Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein | Susan Telford, Mei Chang | 1996-01-09 |
| 5456757 | Susceptor for vapor deposition | Atsunobu Ohkuba, Akihiko Saito, Katsumasa Anan | 1995-10-10 |