Michio Aruga — 15 Patents at Applied Materials

Michio Aruga has been granted 15 US patents while listed as an inventor at Applied Materials. The first was granted in 1995 and the most recent in June 2023. Michio Aruga ranks #307,048 of 4,157,543 US inventors in our database (top 7.4%). Patent records list Michio Aruga in Chiba, JP.

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Showing 1–15 of 15 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
11687439	Automatic window generation for process trace	Richard Burch, Kazuki Kunitoshi, Nobichika Akiya	2023-06-27	$15,677,000
7036453	Apparatus for reducing plasma charge damage for plasma processes	Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi	2006-05-02	$17,089,000
6660662	Method of reducing plasma charge damage for plasma processes	Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi	2003-12-09	$24,611,000
6632726	Film formation method and film formation apparatus	Atsushi Tabata	2003-10-14	$38,083,000
6090706	Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein	Susan Telford, Mei Chang	2000-07-18	$139,716,000
5997950	Substrate having uniform tungsten silicide film and method of manufacture	Susan G. Telford, Meng Chu Tseng, Klaus-Dieter Rinnen	1999-12-07	$146,217,000
5877086	Metal planarization using a CVD wetting film	—	1999-03-02	$31,446,000
5779848	Corrosion-resistant aluminum nitride coating for a semiconductor chamber window	—	1998-07-14	$20,241,000
5688331	Resistance heated stem mounted aluminum susceptor assembly	Atsunobu Ohkura, Akihiko Saito, Kenji Suzuki, Kenichi Taguchi, Dale R. DuBois +1 more	1997-11-18	$45,592,000
5643633	Uniform tungsten silicide films produced by chemical vapor depostiton	Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg	1997-07-01	$28,802,000
5558910	Uniform tungsten silicide films produced by chemical vapor deposition	Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg	1996-09-24	$34,258,000
5510297	Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor	Susan Telford, Mei Chang	1996-04-23	$50,456,000
5500249	Uniform tungsten silicide films produced by chemical vapor deposition	Susan G. Telford, Meng Chu Tseng	1996-03-19	$89,986,000
5482749	Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein	Susan Telford, Mei Chang	1996-01-09	$27,163,000
5456757	Susceptor for vapor deposition	Atsunobu Ohkuba, Akihiko Saito, Katsumasa Anan	1995-10-10	$32,005,000

Michio Aruga — 15 Patents

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