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Automatic window generation for process trace |
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Method of reducing plasma charge damage for plasma processes |
Tetsuya Ishikawa, Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi |
2003-12-09 |
| 6632726 |
Film formation method and film formation apparatus |
Atsushi Tabata |
2003-10-14 |
| 6090706 |
Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein |
Susan Telford, Mei Chang |
2000-07-18 |
| 5997950 |
Substrate having uniform tungsten silicide film and method of manufacture |
Susan G. Telford, Meng Chu Tseng, Klaus-Dieter Rinnen |
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| 5877086 |
Metal planarization using a CVD wetting film |
— |
1999-03-02 |
| 5779848 |
Corrosion-resistant aluminum nitride coating for a semiconductor chamber window |
— |
1998-07-14 |
| 5688331 |
Resistance heated stem mounted aluminum susceptor assembly |
Atsunobu Ohkura, Akihiko Saito, Kenji Suzuki, Kenichi Taguchi, Dale R. DuBois +1 more |
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Uniform tungsten silicide films produced by chemical vapor depostiton |
Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg |
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| 5558910 |
Uniform tungsten silicide films produced by chemical vapor deposition |
Susan G. Telford, Meng Chu Tseng, Moshe Eizenberg |
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| 5510297 |
Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor |
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| 5500249 |
Uniform tungsten silicide films produced by chemical vapor deposition |
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| 5482749 |
Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein |
Susan Telford, Mei Chang |
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| 5456757 |
Susceptor for vapor deposition |
Atsunobu Ohkuba, Akihiko Saito, Katsumasa Anan |
1995-10-10 |