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2004-08-10 |
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Process conditions and precursors for atomic layer deposition (ALD) of AL2O3 |
Kevin Song, Jallepally Ravi, Liang-Yuh Chen |
2003-09-16 |
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Methods and apparatus for improved vaporization of deposition material in a substrate processing system |
John V. Schmitt, Christophe Marcadal, Anzhong Chang, Ling Chen |
2003-07-22 |
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2001-08-14 |
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Method and apparatus for depositing material upon a semiconductor wafer using a transition chamber of a multiple chamber semiconductor wafer processing system |
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2001-06-26 |
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2001-03-06 |
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Wafer out-of-pocket detection tool |
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2000-08-08 |
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2000-05-16 |
