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Uniform heat trace and secondary containment for delivery lines for processing system |
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2002-12-24 |
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Method for unreacted precursor conversion and effluent removal |
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2002-06-11 |
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Method and apparatus for depositing material upon a semiconductor wafer using a transition chamber of a multiple chamber semiconductor wafer processing system |
Xin Sheng Guo, Shih-Hung Li |
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Uniform heat trace and secondary containment for delivery lines for processing system |
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2001-03-20 |
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Method and apparatus for improved control of process and purge material in substrate processing system |
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Apparatus and method for controlling a flow of process material to a deposition chamber |
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Chemical vapor deposition hot-trap for unreacted precursor conversion and effluent removal |
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2000-08-08 |
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2000-08-08 |
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1999-11-09 |
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