GP

Gopalakrishna B. Prabhu

Applied Materials: 25 patents #481 of 7,310Top 7%
GT Gtat: 2 patents #33 of 101Top 35%
TT Twin Creeks Technologies: 2 patents #16 of 37Top 45%
IBM: 1 patents #44,794 of 70,183Top 65%
Overall (All Time): #127,762 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 25 most recent of 29 patents

Patent #TitleCo-InventorsDate
12276490 System and method to map thickness variations of substrates in manufacturing systems Mehdi Vaez-Iravani, Todd Egan 2025-04-15
11768984 Parameter sensing and computer modeling for gas delivery health monitoring Ala Moradian, James L'HEUREUX, Shuran Sheng, Rohit Mahakali, Karthik Ramanathan +4 more 2023-09-26
8694145 Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles Arulkumar Shanmugasundram, Alexander T. Schwarm 2014-04-08
8518724 Method to form a device by constructing a support element on a thin semiconductor lamina Christopher J. Petti, Mohamed M. Hilali, Theodore H. Smick, Venkatesan Murali, Kathy J. Jackson +1 more 2013-08-27
8388412 Retaining ring with shaped profile Yin Yuan, Jeonghoon Oh, Gregory E. Menk 2013-03-05
8349626 Creation of low-relief texture for a photovoltaic cell Zhiyong Li, David Tanner, Mohamed H. Hilali 2013-01-08
8231431 Solar panel edge deletion module Dhruv Gajaria, Zhiyong Li, Yacov Elgar, John Visitacion, Yong Liu +8 more 2012-07-31
8173452 Method to form a device by constructing a support element on a thin semiconductor lamina Christopher J. Petti, Mohamed M. Hilali, Theodore H. Smick, Venkatesan Murali, Kathy J. Jackson +1 more 2012-05-08
8101451 Method to form a device including an annealed lamina and having amorphous silicon on opposing faces Venkatesan Murali, Christopher J. Petti, Theodore H. Smick, Mohamed M. Hilali, Kathy J. Jackson +1 more 2012-01-24
8070909 Feedback control of chemical mechanical polishing device providing manipulation of removal rate profiles Arulkumar Shanmugasundram, Alexander T. Schwarm 2011-12-06
8033895 Retaining ring with shaped profile Yin Yuan, Jeonghoon Oh, Gregory E. Menk 2011-10-11
7908743 Method for forming an electrical connection Zhiyong Li, Chuck Luu, Danny Cam Toan Lu, Garry K. Kwong, David Tanner 2011-03-22
7841925 Polishing article with integrated window stripe Gregory E. Menk, Peter McReynolds, Erik S. Rondum, Anand N. Iyer, Garlen C. Leung 2010-11-30
7601050 Polishing apparatus with grooved subpad Steven M. Zuniga, Peter McReynolds, Erik S. Rondum, Benjamin A. Bonner, Henry H. Au +3 more 2009-10-13
7553214 Polishing article with integrated window stripe Gregory E. Menk, Peter McReynolds, Erik S. Rondum, Anand N. Iyer, Garlen C. Leung 2009-06-30
7429210 Materials for chemical mechanical polishing Benjamin A. Bonner, Peter McReynolds, Gregory E. Menk, Anand N. Iyer, Erik S. Rondum +2 more 2008-09-30
7179159 Materials for chemical mechanical polishing Benjamin A. Bonner, Peter McReynolds, Gregory E. Menk, Anand N. Iyer, Erik S. Rondum +2 more 2007-02-20
7160739 Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles Arulkumar Shanmugasundram, Alexander T. Schwarm 2007-01-09
7063597 Polishing processes for shallow trench isolation substrates Thomas H. Osterheld, Garlen C. Leung, Adam Zhong, Peter McReynolds, Yi Tao +3 more 2006-06-20
7040966 Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers Joseph F. Salfelder, Wayne R. Swart, Srinivas R. Mirmira, Laertis Economikos, Fen F. Jamin +3 more 2006-05-09
6677239 Methods and compositions for chemical mechanical polishing Wei-Yung Hsu, Lizhong Sun, Daniel Carl 2004-01-13
6592438 CMP platen with patterned surface Robert D. Tolles, Steven T. Mear, Sidney P. Huey, Fred C. Redeker 2003-07-15
6575825 CMP polishing pad Robert D. Tolles, Steven T. Mear, Steven M. Zuniga, Hung Chih Chen 2003-06-10
6558236 Method and apparatus for chemical mechanical polishing Timothy James Donohue, Declan Liam Brett, Winston Su 2003-05-06
6361420 Method of chemical mechanical polishing with edge control Steven M. Zuniga, Hung Chih Chen 2002-03-26