WS

Wayne R. Swart

Applied Materials: 2 patents #3,641 of 7,310Top 50%
IBM: 1 patents #44,794 of 70,183Top 65%
Overall (All Time): #1,736,351 of 4,157,543Top 45%
2
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12412789 Endpoint optimization for semiconductor processes Avishay Vaxman, Qintao Zhang, Jeffrey P. Koch, David P. Surdock, David J. Lee +3 more 2025-09-09
7040966 Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers Joseph F. Salfelder, Gopalakrishna B. Prabhu, Srinivas R. Mirmira, Laertis Economikos, Fen F. Jamin +3 more 2006-05-09