DM

Dale W. Martin

IBM: 20 patents #5,451 of 70,183Top 8%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
📍 Hyde Park, VT: #2 of 8 inventorsTop 25%
🗺 Vermont: #336 of 4,968 inventorsTop 7%
Overall (All Time): #184,981 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Showing 1–23 of 23 patents

Patent #TitleCo-InventorsDate
9355936 Flattened substrate surface for substrate bonding Edward C. Cooney, III, James S. Dunn, Charles S. Musante, BethAnn Rainey Lawrence, Leathen Shi +2 more 2016-05-31
9165819 High linearity SOI wafer for low-distortion circuit applications Alan B. Botula, Jeffrey E. Hanrahan, Mark D. Jaffe, Alvin J. Joseph, Gerd Pfeiffer +1 more 2015-10-20
8951896 High linearity SOI wafer for low-distortion circuit applications Alan B. Botula, Jeffrey E. Hanrahan, Mark D. Jaffe, Alvin J. Joseph, Gerd Pfeiffer +1 more 2015-02-10
8778737 Flattened substrate surface for substrate bonding Edward C. Cooney, III, James S. Dunn, Charles F. Musante, BethAnn Rainey, Leathen Shi +2 more 2014-07-15
8679863 Fine tuning highly resistive substrate resistivity and structures thereof Jeffrey P. Gambino, Derrick Liu, Gerd Pfeiffer 2014-03-25
7883990 High resistivity SOI base wafer using thermally annealed substrate Max G. Levy, Gerd Pfeiffer, James A. Slinkman 2011-02-08
7446007 Multi-layer spacer with inhibited recess/undercut and method for fabrication thereof James W. Adkisson, Marc W. Cantell, James R. Elliott, James V. Hart, III 2008-11-04
7378712 Gate stacks Steven M. Shank, Michael C. Triplett, Deborah A. Tucker 2008-05-27
7303952 Method for fabricating doped polysilicon lines James W. Adkisson, John J. Ellis-Monaghan, Glenn C. MacDougall, Kirk D. Peterson, Bruce W. Porth 2007-12-04
7190007 Isolated fully depleted silicon-on-insulator regions by selective etch Matthew J. Breitwisch, Chung H. Lam, Randy W. Mann 2007-03-13
7157341 Gate stacks Steven M. Shank, Michael C. Triplett, Deborah A. Tucker 2007-01-02
6949458 Self-aligned contact areas for sidewall image transfer formed conductors Edward W. Conrad, Chung H. Lam, Edmund J. Sprogis 2005-09-27
6610607 Method to define and tailor process limited lithographic features using a modified hard mask process Douglas S. Armbrust, Jed H. Rankin, Sylvia Tousley 2003-08-26
6566759 Self-aligned contact areas for sidewall image transfer formed conductors Edward W. Conrad, Chung H. Lam, Edmund J. Sprogis 2003-05-20
6525371 Self-aligned non-volatile random access memory cell and process to make the same Jeffrey B. Johnson, Chung H. Lam, Dana Lee, Jed H. Rankin 2003-02-25
6486510 Reduction of reverse short channel effects by implantation of neutral dopants Jeffrey S. Brown, Stephen Furkay, Robert J. Gauthier, Jr., James A. Slinkman 2002-11-26
6352912 Reduction of reverse short channel effects by deep implantation of neutral dopants Jeffrey S. Brown, Stephen Furkay, Robert J. Gauthier, Jr., James A. Slinkman 2002-03-05
6294429 Method of forming a point on a floating gate for electron injection Chung H. Lam, Christa R. Willets 2001-09-25
6258673 Multiple thickness of gate oxide Kevin M. Houlihan, Liang Han 2001-07-10
6197632 Method for dual sidewall oxidation in high density, high performance DRAMS Gary B. Bronner, Rama Divakaruni, Scott D. Halle, Rajesh Rengarajan, Mary E. Weybright 2001-03-06
5972765 Use of deuterated materials in semiconductor processing William F. Clark, Jr., Thomas G. Ference, Terence B. Hook 1999-10-26
5926708 Method for providing multiple gate oxide thicknesses on the same wafer 1999-07-20
D307153 Viewer for a door 1990-04-10