| 8634063 |
Wafer with design printed outside active region and spaced by design tolerance of reticle blind |
Robert T. Froebel, Grant N. Pealer, III |
2014-01-21 |
| 7687210 |
Space tolerance with stitching |
Robert K. Leidy, Peter J. Sullivan |
2010-03-30 |
| 7656505 |
Apparatus to easily measure reticle blind positioning with an exposure apparatus |
Robert T. Froebel, Grant N. Pealer, III |
2010-02-02 |
| 7456966 |
Alignment mark system and method to improve wafer alignment search range |
Robert T. Froebel, Peter J. Sullivan |
2008-11-25 |
| 7171319 |
Method and apparatus to separate field and grid parameters on first level wafers |
Edward W. Conrad |
2007-01-30 |
| 7005221 |
Method and apparatus to easily measure reticle blind positioning with an exposure apparatus |
Robert T. Froebel, Grant N. Pealer, III |
2006-02-28 |
| 6528219 |
Dynamic alignment scheme for a photolithography system |
Edward W. Conrad, Arthur C. Winslow |
2003-03-04 |
| 6513796 |
Wafer chuck having a removable insert |
Robert K. Leidy |
2003-02-04 |
| 6344698 |
More robust alignment mark design |
Roger Lawrence Barr, Robert T. Froebel |
2002-02-05 |
| 6259164 |
Offset alignment marks method and apparatus |
Robert Batterson, Katherine Cecelia Norris |
2001-07-10 |
| 5943587 |
Method for making offset alignment marks |
Robert Batterson, Katherine Cecelia Norris |
1999-08-24 |
