Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8634063 | Wafer with design printed outside active region and spaced by design tolerance of reticle blind | Grant N. Pealer, III, Paul D. Sonntag | 2014-01-21 |
| 7656505 | Apparatus to easily measure reticle blind positioning with an exposure apparatus | Grant N. Pealer, III, Paul D. Sonntag | 2010-02-02 |
| 7456966 | Alignment mark system and method to improve wafer alignment search range | Paul D. Sonntag, Peter J. Sullivan | 2008-11-25 |
| 7005221 | Method and apparatus to easily measure reticle blind positioning with an exposure apparatus | Grant N. Pealer, III, Paul D. Sonntag | 2006-02-28 |
| 6344698 | More robust alignment mark design | Roger Lawrence Barr, Paul D. Sonntag | 2002-02-05 |