Issued Patents All Time
Showing 1–25 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12234383 | Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2025-02-25 |
| 12230496 | Organoaminosilane precursors and methods for depositing films comprising same | Manchao Xiao, Xinjian Lei, Richard Ho, Haripin Chandra, Matthew R. MacDonald +1 more | 2025-02-18 |
| 12091581 | High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2024-09-17 |
| 11725111 | Compositions and processes for depositing carbon-doped silicon-containing films | Manchao Xiao, Xinjian Lei, Ronald Martin Pearlstein, Haripin Chandra, Eugene Joseph Karwacki, Jr. +1 more | 2023-08-15 |
| 11692110 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2023-07-04 |
| 11667839 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2023-06-06 |
| 11643599 | Tungsten chemical mechanical polishing for reduced oxide erosion | Chun Lu, Xiaobo Shi, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado, Matthias Stender | 2023-05-09 |
| 11626279 | Compositions and methods for making silicon containing films | Anupama Mallikarjunan, Andrew David Johnson, Meiliang Wang, Raymond Nicholas Vrtis, Bing Han +1 more | 2023-04-11 |
| 11608451 | Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2023-03-21 |
| 11549034 | Oxide chemical mechanical planarization (CMP) polishing compositions | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2023-01-10 |
| 11401441 | Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications | Xiaobo Shi, Laura M. Matz, Chris Keh-Yeuan Li, Ming-Shih Tsai, Pao-Chia Pan +4 more | 2022-08-02 |
| 11326076 | Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2022-05-10 |
| 11254839 | Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing | Xiaobo Shi, Joseph D. Rose, Hongjun Zhou, Krishna P. Murella | 2022-02-22 |
| 11180678 | Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2021-11-23 |
| 11139162 | Organoaminosilane precursors and methods for depositing films comprising same | Manchao Xiao, Xinjian Lei, Richard Ho, Haripin Chandra, Matthew R. MacDonald +1 more | 2021-10-05 |
| 11078417 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2021-08-03 |
| 11072726 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Hongjun Zhou | 2021-07-27 |
| 10991571 | High temperature atomic layer deposition of silicon oxide thin films | Haripin Chandra, Meiliang Wang, Manchao Xiao, Xinjian Lei, Ronald Martin Pearlstein | 2021-04-27 |
| 10920106 | Metal chemical mechanical planarization (CMP) composition and methods therefore | Xiaobo Shi | 2021-02-16 |
| 10894906 | Composite particles, method of refining and use thereof | Hongjun Zhou, John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Dnyanesh Chandrakant Tamboli | 2021-01-19 |
| 10745589 | Chemical mechanical polishing (CMP) of cobalt-containing substrate | Xiaobo Shi, Joseph D. Rose, Timothy Joseph Clore, James Allen Schlueter, Malcolm Grief | 2020-08-18 |
| 10669449 | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof | Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella +5 more | 2020-06-02 |
| 10465096 | Metal chemical mechanical planarization (CMP) composition and methods therefore | Xiaobo Shi | 2019-11-05 |
| 10460929 | Organoaminosilane precursors and methods for depositing films comprising same | Manchao Xiao, Xinjian Lei, Richard Ho, Haripin Chandra, Matthew R. MacDonald +1 more | 2019-10-29 |
| 10453675 | Organoaminosilane precursors and methods for depositing films comprising same | Manchao Xiao, Xinjian Lei, Richard Ho, Haripin Chandra, Matthew R. MacDonald +1 more | 2019-10-22 |