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VU Versum Materials Us: 1 patents #84 of 174Top 50%
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Patent #TitleCo-InventorsDate
11401441 Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications Xiaobo Shi, Laura M. Matz, Chris Keh-Yeuan Li, Ming-Shih Tsai, Chad Chang-Tse Hsieh +4 more 2022-08-02