Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10894906 | Composite particles, method of refining and use thereof | Hongjun Zhou, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli | 2021-01-19 |
| 10669449 | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof | Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella +5 more | 2020-06-02 |
| 10421890 | Composite particles, method of refining and use thereof | Hongjun Zhou, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli | 2019-09-24 |
| 10109493 | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof | Hongjun Zhou, Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella +5 more | 2018-10-23 |
| 10011741 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, Hongjun Zhou, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2018-07-03 |
| 9305476 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, Hongjun Zhou, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2016-04-05 |
| 9062230 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, Hongjun Zhou, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2015-06-23 |
| 8859428 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, Hongjun Zhou, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2014-10-14 |