Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10011741 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Jae-ouk Choo, James Allen Schlueter +6 more | 2018-07-03 |
| 9305476 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Jae-ouk Choo, James Allen Schlueter +6 more | 2016-04-05 |
| 9062230 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Jae-ouk Choo, James Allen Schlueter +6 more | 2015-06-23 |
| 8916473 | Method for forming through-base wafer vias for fabrication of stacked devices | James M. Henry | 2014-12-23 |
| 8859428 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Jae-ouk Choo, James Allen Schlueter +6 more | 2014-10-14 |
| 8114775 | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers | Junaid Ahmed Siddiqui, Steven Masami Aragaki, Robin Edward Richards | 2012-02-14 |
| 7513920 | Free radical-forming activator attached to solid and used to enhance CMP formulations | Junaid Ahmed Siddiqui, Robert Small | 2009-04-07 |
| 7476620 | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers | Junaid Ahmed Siddiqui, Steven Masami Aragaki, Robin Edward Richards | 2009-01-13 |
| 7351662 | Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization | Junaid Ahmed Siddiqui, Robin Edward Richards, Timothy Frederick Compton | 2008-04-01 |
| 6979252 | Low defectivity product slurry for CMP and associated production method | Junaid Ahmed Siddiqui, Rajat Kapoor, Tara Ranae Keefover, Robin Edward Richards | 2005-12-27 |