HO

Hiroto Ohtake

TL Tokyo Electron Limited: 15 patents #423 of 5,567Top 8%
NE Nec: 8 patents #1,742 of 14,502Top 15%
RE Renesas Electronics: 3 patents #1,322 of 4,529Top 30%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
📍 Rifu, OR: #3 of 10 inventorsTop 30%
Overall (All Time): #163,137 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
10529589 Method of plasma etching of silicon-containing organic film using sulfur-based chemistry Erdinc Karakas, Li Wang, Andrew Nolan, Christopher Talone, Shyam Sridhar +1 more 2020-01-07
10410873 Power modulation for etching high aspect ratio features Takuya Mori 2019-09-10
10381238 Process for performing self-limited etching of organic materials Takahito Mukawa 2019-08-13
10340123 Multi-frequency power modulation for etching high aspect ratio features 2019-07-02
10115591 Selective SiARC removal Shyam Sridhar, Li Wang, Andrew Nolan, Sergey Voronin, Alok Ranjan 2018-10-30
9570312 Plasma etching method Ryohei TAKEDA, Mitsuhiro Tomura, Akinori Kitamura, Shinji Higashitsutsumi, Takashi Tsukamoto 2017-02-14
9502537 Method of selectively removing a region formed of silicon oxide and plasma processing apparatus Akinori Kitamura, Eiji Suzuki 2016-11-22
9412607 Plasma etching method Tomiko Kamada, Akinori Kitamura, Yutaka Osada, Yuji Otsuka, Masayuki Kohno +2 more 2016-08-09
9373520 Multilayer film etching method and plasma processing apparatus Shota Yoshimura, Eiji Suzuki, Tomiko Kamada 2016-06-21
9305795 Plasma processing method Tomiko Kamada 2016-04-05
9105585 Etching method Hironori Matsuoka, Kosuke Kariu 2015-08-11
9087798 Etching method Akinori Kitamura, Hironori Matsuoka, Yoko Noto 2015-07-21
9034698 Semiconductor device manufacturing method Toshihisa Ozu, Shota Yoshimura, Kosuke Kariu, Takashi Tsukamoto 2015-05-19
8808562 Dry metal etching method Yusuke Ohsawa, Eiji Suzuki, Kaushik A. Kumar, Andrew Metz 2014-08-19
8803285 Semiconductor device capable of reducing interelectrode leak current and manufacturing method thereof Naoya Inoue, Ippei Kume, Takeshi Toda, Yoshihiro Hayashi 2014-08-12
8664125 Highly selective spacer etch process with reduced sidewall spacer slimming Angelique Raley, Takuya Mori 2014-03-04
8592303 Wiring structure and method for manufacturing the same Munehiro Tada, Yoshihiro Hayashi, Yoshimichi Harada, Fuminori Ito, Tatsuya Usami 2013-11-26
8278763 Semiconductor device Munehiro Tada, Fuminori Ito, Yoshihiro Hayashi, Hironori Yamamoto 2012-10-02
8043957 Semiconductor device, method for manufacturing semiconductor device and apparatus for manufacturing semiconductor Munehiro Tada, Fuminori Ito, Yoshihiro Hayashi, Hironori Yamamoto 2011-10-25
7999392 Multilayer wiring structure, semiconductor device, pattern transfer mask and method for manufacturing multilayer wiring structure Yoshihiro Hayashi 2011-08-16
7701060 Wiring structure and method for manufacturing the same Munehiro Tada, Yoshihiro Hayashi, Yoshimichi Harada, Fuminori Ito, Tatsuya Usami 2010-04-20
7622808 Semiconductor device and having trench interconnection Masayoshi Tagami, Munehiro Tada, Yoshihiro Hayashi 2009-11-24
7482694 Semiconductor device and its manufacturing method Munehiro Tada, Yoshimichi Harada, Kenichiro Hijioka, Shinobu Saitoh, Yoshihiro Hayashi 2009-01-27
6972453 Method of manufacturing a semiconductor device capable of etching a multi-layer of organic films at a high selectivity Shinobu Saitoh, Munehiro Tada, Yoshihiro Hayashi 2005-12-06
6054063 Method for plasma treatment and apparatus for plasma treatment Seiji Samukawa 2000-04-25