Issued Patents All Time
Showing 25 most recent of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12221694 | Conditioning of a processing chamber | Pramit Manna, Timothy Joseph Franklin | 2025-02-11 |
| 12091749 | Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet | Tetsuya Ishikawa, Matthias Bauer, Manjunath Subbanna, Ala Moradian, Kartik Shah +4 more | 2024-09-17 |
| 12074042 | High-density substrate processing systems and methods | Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan Nguyen, Khokan Chandra Paul | 2024-08-27 |
| 12060651 | Chamber architecture for epitaxial deposition and advanced epitaxial film applications | Tetsuya Ishikawa, Kartik Shah, Ala Moradian, Manjunath Subbanna, Matthias Bauer +2 more | 2024-08-13 |
| 12018372 | Gas injector for epitaxy and CVD chamber | Tetsuya Ishikawa, Matthias Bauer, Ala Moradian, Manjunath Subbanna, Kartik Shah +4 more | 2024-06-25 |
| 11978635 | Silicide films through selective deposition | Abhijit Basu Mallick, Nicolas L. Breil | 2024-05-07 |
| 11705335 | Conformal high concentration boron doping of semiconductors | Srinivas Gandikota, Abhijit Basu Mallick, Rui Cheng, Susmit Singha Roy, Gaurav Thareja +2 more | 2023-07-18 |
| 11574826 | High-density substrate processing systems and methods | Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan Nguyen, Khokan Chandra Paul | 2023-02-07 |
| 11446740 | Multiple sequential linear powder dispensers for additive manufacturing | Christopher A. Rowland, Anantha K. Subramani, Kasiraman Krishnan, Kartik Ramaswamy, Thomas Brezoczky +5 more | 2022-09-20 |
| 11328928 | Conformal high concentration boron doping of semiconductors | Srinivas Gandikota, Abhijit Basu Mallick, Rui Cheng, Susmit Singha Roy, Gaurav Thareja +2 more | 2022-05-10 |
| 11037825 | Selective removal process to create high aspect ratio fully self-aligned via | Amrita B. Mullick, Madhur Sachan, He Ren, Regina Freed, Uday Mitra | 2021-06-15 |
| 10950450 | Silicide films through selective deposition | Abhijit Basu Mallick, Nicolas L. Breil | 2021-03-16 |
| 10910238 | Heater pedestal assembly for wide range temperature control | Kaushik Alayavalli, Ajit Balakrishna, Sanjeev Baluja, Amit Kumar BANSAL, Matthew J. Busche +3 more | 2021-02-02 |
| 10790191 | Selective removal process to create high aspect ratio fully self-aligned via | Amrita B. Mullick, Madhur Sachan, He Ren, Regina Freed, Uday Mitra | 2020-09-29 |
| 10607841 | Silicide films through selective deposition | Abhijit Basu Mallick, Nicolas L. Breil | 2020-03-31 |
| 10373823 | Deployment of light energy within specific spectral bands in specific sequences for deposition, treatment and removal of materials | Atashi Basu, Pramit Manna, Khokan Chandra Paul, Diwakar Kedlaya | 2019-08-06 |
| 10128197 | Bottom processing | Joseph M. Ranish, Aaron Muir Hunter | 2018-11-13 |
| 10077508 | Multizone control of lamps in a conical lamphead using pyrometers | Joseph M. Ranish, Paul Brillhart, Jose Antonio Marin, Satheesh Kuppurao, Balasubramanian Ramachandran +1 more | 2018-09-18 |
| 10026613 | Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films | Fareen Adeni Khaja, Errol Antonio C. Sanchez, Patrick M. Martin | 2018-07-17 |
| 10020204 | Bottom processing | Joseph M. Ranish, Aaron Muir Hunter | 2018-07-10 |
| 9870919 | Process chamber having separate process gas and purge gas regions | Joseph M. Ranish, Paul Brillhart, Jose Antonio Marin, Satheesh Kuppurao, Balasubramanian Ramachandran +1 more | 2018-01-16 |
| 9856580 | Apparatus for impurity layered epitaxy | Errol Antonio C. Sanchez | 2018-01-02 |
| 9799531 | Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films | Fareen Adeni Khaja, Errol Antonio C. Sanchez, Patrick M. Martin | 2017-10-24 |
| 9580835 | Multizone control of lamps in a conical lamphead using pyrometers | Joseph M. Ranish, Paul Brillhart, Jose Antonio Marin, Satheesh Kuppurao, Balasubramanian Ramachandran +1 more | 2017-02-28 |
| 9455143 | Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devices | Aaron Muir Hunter, Matthias Bauer, Amikam Sade | 2016-09-27 |