Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10026613 | Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films | Swaminathan Srinivasan, Fareen Adeni Khaja, Errol Antonio C. Sanchez | 2018-07-17 |
| 9799531 | Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films | Swaminathan Srinivasan, Fareen Adeni Khaja, Errol Antonio C. Sanchez | 2017-10-24 |
| 9767987 | Method and system for modifying substrate relief features using ion implantation | Ludovic Godet, Timothy J. Miller, Vikram Singh | 2017-09-19 |
| 9716012 | Methods of selective layer deposition | David Thompson, Huixiong Dai, Timothy Michaelson, Kadthala Ramaya Narendrnath, Robert Jan Visser +2 more | 2017-07-25 |
| 9425027 | Methods of affecting material properties and applications therefor | Ludovic Godet, Christopher R. Hatem, Deepak A. Ramappa, Xianfeng Lu, Anthony Renau | 2016-08-23 |
| 9406507 | Utilization of angled trench for effective aspect ratio trapping of defects in strain relaxed heteroepitaxy of semiconductor films | Swaminathan Srinivasan, Fareen Adeni Khaja, Errol Antonio C. Sanchez | 2016-08-02 |
| 9340877 | Method and system for modifying photoresist using electromagnetic radiation and ion implantation | Ludovic Godet | 2016-05-17 |
| 8974683 | Method and system for modifying resist openings using multiple angled ions | Ludovic Godet, Joseph C. Olson, Andrew J. Hornak | 2015-03-10 |
| 8952344 | Techniques for processing photoresist features using ions | Frank Sinclair, Ludovic Godet, Armah Kpissay | 2015-02-10 |
| 8937019 | Techniques for generating three dimensional structures | Jonathan Gerald England, David Cox | 2015-01-20 |
| 8912097 | Method and system for patterning a substrate | Steven Carlson, Choong-Young Oh, Jung Wook Park | 2014-12-16 |
| 8778603 | Method and system for modifying substrate relief features using ion implantation | Ludovic Godet, Timothy J. Miller, Vikram Singh | 2014-07-15 |
| 8698109 | Method and system for controlling critical dimension and roughness in resist features | Ludovic Godet, Christopher J. Leavitt, Joseph C. Olson | 2014-04-15 |
| 8460569 | Method and system for post-etch treatment of patterned substrate features | Ludovic Godet, Christopher R. Hatem, Timothy J. Miller | 2013-06-11 |
| 8435727 | Method and system for modifying photoresist using electromagnetic radiation and ion implantation | Ludovic Godet | 2013-05-07 |
| 8354655 | Method and system for controlling critical dimension and roughness in resist features | Ludovic Godet, Christopher J. Leavitt, Joseph C. Olson | 2013-01-15 |
| 8133804 | Method and system for modifying patterned photoresist using multi-step ion implantation | Ludovic Godet, Joseph C. Olson | 2012-03-13 |
| 7894918 | System for analyzing batch processes | Hemant Kanodia, Mikael Davidsson, Rajani Nair, Anne Poorman, Joachim Ruhe | 2011-02-22 |
| 7049034 | Photomask having an internal substantially transparent etch stop layer | Matthew Lassiter, Darren Taylor, Michael Jerome Cangemi, Eric Poortinga | 2006-05-23 |
| 5635428 | Global planarization using a polyimide block | Dennis Yost | 1997-06-03 |
| 5508233 | Global planarization process using patterned oxide | Dennis Yost | 1996-04-16 |
| 5220157 | Scrip controlled cash dispensing system | Tod G. Franklin | 1993-06-15 |