Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8124527 | CMP process flow for MEMS | Joseph Damian Gordon Lacey, Thomas L. Maguire, Vikram Joshi | 2012-02-28 |
| 7718009 | Cleaning submicron structures on a semiconductor wafer surface | Steven Verhaverbeke, Jianshe Tang, Roman Gouk, Brian J. Brown, Han-Wen Chen +2 more | 2010-05-18 |
| 7521374 | Method and apparatus for cleaning semiconductor substrates | Steven Verhaverbeke, Roman Gouk | 2009-04-21 |
| 7332360 | Early detection of metal wiring reliability using a noise spectrum | Michael C. Smayling | 2008-02-19 |
| 7313456 | Method and apparatus for capturing and using design intent in an integrated circuit fabrication process | John Hamilton Madok, Robin Cheung | 2007-12-25 |
| 7227244 | Integrated low k dielectrics and etch stops | Claes Bjorkman, Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2007-06-05 |
| 6858153 | Integrated low K dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2005-02-22 |
| 6669858 | Integrated low k dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2003-12-30 |
| 6340435 | Integrated low K dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2002-01-22 |
| 5635428 | Global planarization using a polyimide block | Patrick M. Martin | 1997-06-03 |
| 5508233 | Global planarization process using patterned oxide | Patrick M. Martin | 1996-04-16 |
| 5444018 | Metallization process for a semiconductor device | Thomas D. Bonifield, Roc Blumenthal | 1995-08-22 |