Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Shaped electrodes for improved plasma exposure from vertical plasma source

Shaped electrodes for improved plasma exposure from vertical plasma source

US Patent 11315763 · Granted Apr 26, 2022

Estimated economic value: $43,127,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedesta2025
Showerhead design to control stray deposition2025
Semiconductor processing chambers and methods for deposition and etch2025
Plasma source with floating electrodes2025
Servo amplifier2025
Multi-zone heater control for wafer processing equipment2025
Servo amplifier2025
Vertically adjustable plasma source2025
Vertically adjustable plasma source2025
Photoresist deposition using independent multichannel showerhead2025
Capacitive sensor for monitoring gas concentration2025
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-2025