| 12421601 |
Rotary reactor for uniform particle coating with thin films |
Colin C. Neikirk, Pravin K. Narwankar, Kaushal Gangakhedkar, Visweswaren Sivaramakrishnan, Jonathan Frankel +2 more |
2025-09-23 |
| 12394604 |
Plasma source with floating electrodes |
Dmitry A. Dzilno, Robert B. Moore |
2025-08-19 |
| 12220678 |
Paddle configuration for a particle coating reactor |
Govindraj Desai, Sekar Krishnasamy, Sumedh Acharya, Dakshalkumar Patel, Jonathan Frankel +2 more |
2025-02-11 |
| 12134091 |
Reactor for coating particles in stationary chamber with rotating paddles |
Jonathan Frankel, Colin C. Neikirk, Pravin K. Narwankar, Govindraj Desai, Sekar Krishnasamy |
2024-11-05 |
| 12077856 |
Reactor for coating particles in stationary chamber with rotating paddles and gas injection |
Jonathan Frankel, Colin C. Neikirk, Pravin K. Narwankar, Govindraj Desai, Sekar Krishnasamy +1 more |
2024-09-03 |
| 12071685 |
Gas injection for de-agglomeration in particle coating reactor |
Jonathan Frankel, Sekar Krishnasamy, Govindraj Desai, Sandip S. Desai |
2024-08-27 |
| 11717800 |
Reactor for coating particles in stationary chamber with rotating paddles |
Jonathan Frankel, Colin C. Neikirk, Pravin K. Narwankar, Govindraj Desai, Sekar Krishnasamy |
2023-08-08 |
| 11692265 |
Gas injection for de-agglomeration in particle coating reactor |
Jonathan Frankel, Sekar Krishnasamy, Govindraj Desai, Sandip S. Desai |
2023-07-04 |
| 11674223 |
Reactor for coating particles in stationary chamber with rotating paddles and gas injection |
Jonathan Frankel, Colin C. Neikirk, Pravin K. Narwankar, Govindraj Desai, Sekar Krishnasamy +1 more |
2023-06-13 |
| 11299806 |
Gas injection for de-agglomeration in particle coating reactor |
Jonathan Frankel, Sekar Krishnasamy, Govindraj Desai, Sandip S. Desai |
2022-04-12 |
| 11180851 |
Rotary reactor for uniform particle coating with thin films |
Colin C. Neikirk, Pravin K. Narwankar, Kaushal Gangakhedkar, Visweswaren Sivaramakrishnan, Jonathan Frankel +2 more |
2021-11-23 |
| 11174552 |
Rotary reactor for uniform particle coating with thin films |
Colin C. Neikirk, Pravin K. Narwankar, Kaushal Gangakhedkar, Visweswaren Sivaramakrishnan, Jonathan Frankel +2 more |
2021-11-16 |
| 11041253 |
Silicon wafers by epitaxial deposition |
Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Andrzej Kaszuba, Jean R. Vatus |
2021-06-22 |
| 10961621 |
CVD reactor chamber with resistive heating and substrate holder |
Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Timothy N. Kleiner |
2021-03-30 |
| 9982363 |
Silicon wafers by epitaxial deposition |
Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Andrzej Kaszuba, Jean R. Vatus |
2018-05-29 |
| 9920451 |
High throughput multi-wafer epitaxial reactor |
Visweswaren Sivaramakrishnan, Kedarnath Sangam, Tirunelveli S. Ravi, Andrzej Kaszuba |
2018-03-20 |
| 9556522 |
High throughput multi-wafer epitaxial reactor |
Visweswaren Sivaramakrishnan, Kedarnath Sangam, Tirunelveli S. Ravi, Andrzej Kaszuba |
2017-01-31 |
| 9255346 |
Silicon wafers by epitaxial deposition |
Visweswaren Sivaramakrishnan, Tirunelveli S. Ravi, Andrzej Kaszuba, Jean R. Vatus |
2016-02-09 |
| 8673081 |
High throughput multi-wafer epitaxial reactor |
Visweswaren Sivaramakrishnan, Kedarnath Sangam, Tirunelveli S. Ravi, Andrzej Kaszuba |
2014-03-18 |
| 8298629 |
High throughput multi-wafer epitaxial reactor |
Visweswaren Sivaramakrishnan, Kedarnath Sangam, Tirunelveli S. Ravi, Andrzej Kaszuba |
2012-10-30 |
| 6162285 |
Ozone enhancement unit |
Gary Fong |
2000-12-19 |
| 6123097 |
Apparatus and methods for controlling process chamber pressure |
Imad Yousif, Vincente Lim, Craig Bercaw |
2000-09-26 |
| 5904170 |
Pressure flow and concentration control of oxygen/ozone gas mixtures |
Keith Harvey, Irwin Silvestre |
1999-05-18 |
| 5902404 |
Resonant chamber applicator for remote plasma source |
Gary Fong, Irwin Silvestre |
1999-05-11 |
| 5882414 |
Method and apparatus for self-cleaning a blocker plate |
Gary Fong, Visweswaren Sivaramakrishman |
1999-03-16 |
